Actinic mask blank inspection and signal analysis for detecting phase defects down to 1.5 nm in height

Japanese Journal of Applied Physics

Volumn 48, Issue 6 PART 2, 2009, Pages

  Terasawa, Tsuneo ^a   Yamane, Takeshi ^a   Tanaka, Toshihiko ^a   Iwasaki, Teruo ^a   Suga, Osamu ^a   Tomie, Toshihisa ^b  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTINIC INSPECTION; AT-WAVELENGTH; BACK-ILLUMINATED; BUMP DEFECTS; CONVEX MIRROR; DARK FIELD IMAGES; DARK FIELD IMAGING; EXTREME ULTRAVIOLET LITHOGRAPHY MASKS; ILLUMINATION OPTICS; INSPECTION SYSTEM; MASK BLANK INSPECTION; MULTILAYER DEFECTS; PHASE DEFECTS; SCHWARZSCHILD OPTICS; TEST MASKS;

DEFECTS; INSPECTION; SIGNAL ANALYSIS;

OPTICS;

EID: 70249087344     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.48.06FA04     Document Type: Article

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