EUV and non-EUV inspection of reticle defect repair sites

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 1, 2007, Pages

  Goldberg, Kenneth A ^a   Barty, Anton ^b   Seidel, Phillip ^c   Edinger, Klaus ^d   Fettig, Rainer ^d   Kearney, Patrick ^c   Han, Hakseung ^c   Wood II, Obert R ^e  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^c SEMATECH   (United States)

^d CARL ZEISS SMT AG   (Germany)

^e ADVANCED MICRO DEVICES   (United States)

Author keywords

Actinic inspection; Defect repair; EUV; Extreme ultraviolet lithography; Mask inspection

Indexed keywords

DEFECTS; INSPECTION; LIGHT SCATTERING; REFLECTION; SCANNING ELECTRON MICROSCOPY;

ACTINIC INSPECTION; DARKFIELD MEASUREMENTS; DEFECT REPAIR;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148843759     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712202     Document Type: Conference Paper

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