Actinic review of EUV masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Feldmann, Heiko ^a   Ruoff, Johannes ^a   Harnisch, Wolfgang ^a   Kaiser, Winfried ^a  

^a CARL ZEISS SMT AG   (Germany)

Author keywords

defect review; EUV mask infrastructure; EUV optics; photomask metrology; scanner emulation

Indexed keywords

ACTINIC INSPECTION; AERIAL IMAGE METROLOGY SYSTEMS; DEFECT REVIEW; EUV MASK; EUV MIRRORS; EUV OPTICS; EUV SOURCE; FLOOR SPACE; IMAGING CONDITIONS; LITHOGRAPHY TOOLS; MASK DEFECTS; PHOTOMASK METROLOGY; POWER REQUIREMENT; PRODUCTION REQUIREMENTS; PROJECTION MICROSCOPE; SOURCE SELECTION;

DEFECTS; EXTREME ULTRAVIOLET LITHOGRAPHY; LIGHT SOURCES; MASKS; MIRRORS; STABILITY CRITERIA;

SCANNING;

EID: 77953453582     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.848380     Document Type: Conference Paper

References (7)

1. B. Rice, "The EUV Mask Metrology Gap", 2009 International Symposium on Extreme Ultraviolet Lithography, Praque, Czech Republic (2009).
2. C. Clifford et al, "Investigation of buried EUV mask defect printability using actinic inspection and fast simulation," Proc. SPIE 7488, 74882H (2009).
3. P. Kürz et al, "Optics for EUV lithography", 2009 International Symposium on Extreme Ultraviolet Lithography, Praque, Czech Republic (2009).
4. A. Barty et al, "Design and evaluation of system configurations for an EUV mask inspection microscope", Tech. Rep. UCRL-CR-149774 Lawrence Livermore National Laboratory, Livermore, Calif., 2002; available at http:www.llnl.gov-library.
5. I. Mochi et al, "Improving the performance of the Actinic Inspection Tool with an optimized alignment procedure" SPIE, 7271, 727123 (2009).
6. Z-Y. Pan et al, "Design Influence of Shot Noise on CDU with DUV, EUV, and E-Beam" Proc. SPIE 6924, 69341K (2008)
7. N. Harned, et al " Strategy for Minimizing EUV Optics Contamination During Exposure", EUV Symposium, Sept. 29, 2008