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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

Mask inspection technologies for 22nm HP and beyond

(4) Wack, Daniel a Zhang, Qiang Q a Inderhees, Gregg a Lopez, Dan a

a KLA TENCOR CORPORATION (United States)

Author keywords

EUV Lithography; Mask Inspection

Indexed keywords

ABSORBER DESIGN; DEFECT SENSITIVITY; EUV LITHOGRAPHY; INSPECTION TECHNOLOGY; KEY ISSUES; MASK INSPECTION; OPTICAL CONTRAST; OPTICAL INSPECTION SYSTEMS;

EXTREME ULTRAVIOLET LITHOGRAPHY; INSPECTION EQUIPMENT; LITHOGRAPHY; OPTICAL INSTRUMENTS; OPTICAL TESTING;

INSPECTION;

EID: 77953460064 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.850766 Document Type: Conference Paper

Times cited : (5)

References (8)

1
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- (2000) Proc. SPIE , vol.4066 , pp. 116
- Yan, P.-Y.¹ Zhang, G.² Kofron, P.³ Powers, J.E.⁴ Tran, M.⁵ Liang, T.⁶ Stivers, A.R.⁷ Lo, F.-C.⁸

2
- 0036380264
- Impact of EUVL mask buffer and absorber material properties on mask quality and performance
- Pei-yang Yan, "Impact of EUVL mask buffer and absorber material properties on mask quality and performance", Proc. SPIE 4688, 150 (2002).
- (2002) Proc. SPIE , vol.4688 , pp. 150
- Yan, P.-Y.¹

3
- 35148894055
- Properties of EUVL masks as a function of capping layer and absorber stack structures
- Hwan-Seok Seo, Jinhong Park, Seung-Yoon Lee, Joo-On Park, Hun Kim, Seong-Sue Kim, and Han-Ku Cho, "Properties of EUVL masks as a function of capping layer and absorber stack structures", Proc. SPIE 6517, 65171G (2007).
- (2007) Proc. SPIE , vol.6517
- Seo, H.-K.¹ Park, J.² Lee, S.-Y.³ Park, J.-O.⁴ Kim, H.⁵ Kim, S.-S.⁶ Cho, H.-K.⁷

4
- 67149086737
- Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication
- Hwan-Seok Seo, Dong-Gun Lee, Byung-Sup Ahn, Hakseung Han, Sungmin Huh, In-Yong Kang, Hoon Kim, Dongwan Kim, Seong-Sue Kim, and Han-Ku Cho, "Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication", Proc. SPIE 7271, 72710D (2009).
- (2009) Proc. SPIE , vol.7271
- Seo, H.-K.¹ Lee, D.-G.² Ahn, B.-S.³ Han, H.⁴ Huh, S.⁵ Kang, I.-Y.⁶ Kim, H.⁷ Kim, D.⁸ Kim, S.-S.⁹ Cho, H.-K.¹⁰

5
- 0035765795
- Enhanced optical inspectability of patterned EUVL mask
- Ted Liang, Alan R. Stivers, Pei-yang Yan, Edita Tejnil, and Guojing Zhang, "Enhanced optical inspectability of patterned EUVL mask", Proc. SPIE 4562, 288 (2002).
- (2002) Proc. SPIE , vol.4562 , pp. 288
- Liang, T.¹ Stivers, A.R.² Yan, P.-Y.³ Tejnil, E.⁴ Zhang, G.⁵

6
- 77953441756
- IMEC
- DEF32 EUV mask supplied courtesy of Rik Jonckheere, IMEC.
- DEF32 EUV Mask Supplied Courtesy of Rik Jonckheere

7
- 77953404393
- http://www.sematech.org/corporate/news/releases/20100218.html

8
- 77953426648
- Inspecting EUV mask blanks with a 193nm inspection system
- Stanley Stokowski et al, "Inspecting EUV mask blanks with a 193nm inspection system", SPIE Advanced Lithography 2010, 7636-34.
- SPIE Advanced Lithography , vol.2010 , pp. 7636-7734
- Stokowski, S.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.