Development of a technique for rapid at-wavelength inspection of EUV mask blanks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue II, 1999, Pages 606-614

  Spector, S J ^a   Luo, Ping ^a   Novembre, A E ^a   Ocola, L ^a   White, D L ^a   Tennant, D M ^a   Wood II, O R ^a  

^a BROOKHAVEN NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INSPECTION; MASKS; OPTICAL MULTILAYERS; PHOTORESISTS; REFLECTIVE COATINGS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0032675474     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351134     Document Type: Conference Paper

References (13)