Collecting EUV mask images through focus by wavelength tuning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Goldberg, Kenneth A ^a   Mochi, Iacopo ^a   Huh, Sungmin ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b SEMATECH   (United States)

Author keywords

Actinic mask inspection; EUV; Extreme ultraviolet lithography; Fresnel zoneplate; Imaging; Reticle

Indexed keywords

ACTINIC MASK INSPECTION; EUV; FRESNEL ZONEPLATE; IMAGING; RETICLE;

LASER PULSES; MASKS; OPTICAL FILTERS; OPTICAL INSTRUMENTS; TUNING; ULTRAVIOLET DEVICES;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 67149112242     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824433     Document Type: Conference Paper

References (10)

1. H.-S. Han, W. Cho, K. A. Goldberg, E. M. Gullikson, C.-U. Jeon, S. Wurm, "Determining the critical size of EUV-mask substrate defects," SPIE 6921, 69211Y (2008).
2. C. H. Clifford, S. Wiraatmadja, T. T. Chan, A. R. Neureuther, K. A. Goldberg, I. Mochi, T. Liang, "Comparison of fast 3D simulation and actinic inspection for EUV masks with buried defects," these proceedings.
3. K. A. Goldberg, I. Mochi, P. P. Naulleau, H.-S. Han, S. Huh, "Benchmarking EUV mask inspection beyond 0.25 NA," SPIE 7122, 71222E-1 (2008).
4. K. A. Goldberg, P. Naulleau, I. Mochi, E. H. Anderson, S. B. Rekawa, C. D. Kemp, and R. F. Gunion, H.-S. Han, S. Huh, "Actinic extreme ultraviolet mask inspection beyond 0.25 numerical aperture," J. Vac. Sci. & Technol. B 26 (6), 2220-4 (2008).
5. K. A. Goldberg, P. P. Naulleau, A. Baity, S. B. Rekawa, C. D. Kemp, R. F. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, H.-S. Han, "Performance of actinic EUVL mask imaging using a zoneplate microscope," SPIE 6730, 67305E-1-12 (2007).
6. I. Mochi, K. A. Goldberg, S. Huh, "Improving the performance of the AIT with an optimized alignment procedure," these proceedings.
7. D. Attwood, "Soft X-rays and Extreme Ultraviolet Radiation: Principles and Applications" (Cambridge University Press, 1999).
8. ThroughFocus Software, Version 1, Kanayama Consulting, http://ThroughFocus.com, 2008-9.
9. P. Naulleau, K. Goldberg, I. Mochi, G. Zhang, "Mask Effects on LER," EUVL Symposium 2008, September 2008.
10. I. Mochi, K. A. Goldberg, P. Naulleau, S. Huh, "Achieving Diffraction-limited EUV Aerial Image Microscopy," EUVL Symposium 2008, September 2008.