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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 1, 2004, Pages 264-267

Actinic mask metrology for extreme ultraviolet lithography

(10) Kinoshita, H a,e Haga, T b Hamamoto, K a,e Takada, S a Kazui, N a Kakunai, S a,e Tsubakino, H a Shoki, T c,e Endo, M d Watanabe, T a,e

a UNIVERSITY OF HYOGO (Japan)

b NTT CORPORATION (Japan)

c HOYA CORPORATION (Japan)

d Matushita Electrical Industrial (Japan)

e JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAMERAS; CHARGE COUPLED DEVICES; COMPUTER SIMULATION; DEFECTS; DEPOSITION; IMAGING SYSTEMS; INSPECTION; INTERFEROMETERS; MASKS; MICROSCOPES; MONOCHROMATORS; OPTICAL RESOLVING POWER; ULTRAVIOLET RADIATION; X RAY TUBES;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); EXTREME ULTRAVIOLET MICROSCOPES (EUVM);

PHOTOLITHOGRAPHY;

EID: 3142565705 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1643057 Document Type: Conference Paper

Times cited : (39)

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