Phase measurement of reflection of EUV multilayer mirror using EUV standing waves

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 2970-2974

  Miyake, Akira ^a   Amemiya, Mitsuaki ^a   Masaki, Fumitaro ^a   Watanabe, Yutaka ^a  

^a CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; ELECTRIC FIELDS; INTERFEROMETERS; LASER PRODUCED PLASMAS; LIGHT REFLECTION; LITHOGRAPHY; MATHEMATICAL MODELS; MIRRORS; MOLYBDENUM; OPTIMIZATION; PHASE SHIFT; REFLECTOMETERS; ULTRAVIOLET RADIATION;

FILM THICKNESS; INCIDENCE ANGLES; POINT DIFFRACTION INTERFEROMETERS (PDI); PROJECTION OPTICS;

PHASE MEASUREMENT;

EID: 13244295837     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1815302     Document Type: Conference Paper

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