Signal analysis for the actinic full-field EUVL mask blank inspection system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Yamane, Takeshi ^a   Iwasaki, Teruo ^a   Tanaka, Toshihiko ^a   Terasawa, Tsuneo ^a   Suga, Osamu ^a   Tomie, Toshihisa ^b  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Actinic inspection; Background intensity; EUVL mask; Phase defect; Roughness; SBR

Indexed keywords

ACTINIC INSPECTION; BACKGROUND INTENSITY; EUVL MASK; PHASE DEFECT; ROUGHNESS; SBR;

ACTINIDES; EXTREME ULTRAVIOLET LITHOGRAPHY; INSPECTION; INSPECTION EQUIPMENT; MULTILAYERS; OPTICAL TRANSFER FUNCTION; PHOTOMASKS; SIGNAL ANALYSIS; SURFACE DEFECTS; SURFACE PROPERTIES; SURFACE ROUGHNESS;

DEFECTS;

EID: 62649108295     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801420     Document Type: Conference Paper

References (11)

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