Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3003-3008

  Spector, S J ^a,c   White, D L ^b   Tennant, D M ^b   Ocola, L E ^b   Novembre, A E ^b   Peabody, M L ^b   Wood II, O R ^b  

^a BROOKHAVEN NATIONAL LABORATORY   (United States)

^b LUCENT TECHNOLOGIES   (United States)

^c MIT LINCOLN LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033266680     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590943     Document Type: Article

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