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Volumn 46, Issue 9 B, 2007, Pages 6113-6117

Aerial image mask inspection system for extreme ultraviolet lithography

Author keywords

Defect; EUV lithography; EUV microscope; Mask

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; GLASS; MULTILAYERS;

AERIAL IMAGE MASK INSPECTION SYSTEM; SCHWARZSCHILD OPTICS; X-RAY ZOOMING TUBE;

MASKS;

EID: 34648836133 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.46.6113 Document Type: Article

Times cited : (20)

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