Rapid at-wavelength inspection of EUV mask blanks by photoresist transfer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3546, Issue , 1998, Pages 548-555

  Spector, S J ^a   White, D L ^a   Tennant, D M ^a   Luo, Ping ^a   Wood II, O R ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; LIGHT REFLECTION; PHOTORESISTS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) MASK BLANKS;

MASKS;

EID: 0032300944     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.332877     Document Type: Conference Paper

References (11)