Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 3203-3207

  Harada, Tetsuo ^a,b   Kishimoto, Junki ^a,b   Watanabe, Takeo ^a,b   Kinoshita, Hiroo ^a,b   Lee, Dong Gun ^c  

^a UNIVERSITY OF HYOGO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ACTINIC INSPECTION; CHARGED COUPLED; COHERENT SCATTERING; CRITICAL DIMENSION; DIFFRACTION LIMITED; EUV LITHOGRAPHY; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; HIGH NUMERICAL APERTURES; HOLE PATTERNS; HYBRID INPUT-OUTPUT ALGORITHMS; INTENSITY DATA; NUMERICAL APERTURE; PERIODIC LINES; RECONSTRUCTED IMAGE; SCANNING ELECTRON MICROSCOPES; SEM; TAN ABSORBERS;

IMAGE RECONSTRUCTION; LIGHT; MASKS; MICROSCOPES; SCANNING ELECTRON MICROSCOPY; TANTALUM COMPOUNDS;

ULTRAVIOLET DEVICES;

EID: 72849114364     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3258633     Document Type: Conference Paper

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