A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Huh, Sungmin ^a   Ren, Liping ^a   Chan, David ^a   Wurm, Stefan ^a   Goldberg, Kenneth ^b   Mochi, Iacopo ^b   Nakajima, Toshio ^c   Kishimoto, Masahiro ^c   Ahn, Byungsup ^d   Kang, Inyong ^d   Park, Joo On ^d   Cho, Kyoungyong ^d   Han, Sang In ^e   Laursen, Thomas ^e  

^a SEMATECH   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c AGC Electronics America   (United States)

^d SAMSUNG Electronics   (South Korea)

^e ASML US Inc   (United States)

Author keywords

EUV; inspection; mask; phase defect

Indexed keywords

DEFECT FREE MASK; EUV; EUV MASK; FULL-FIELD; HIGH VOLUME MANUFACTURING; MASK FABRICATION; MASK INSPECTION; NATIVE DEFECT; PHASE DEFECTS; WAFER INSPECTION;

DEFECT DENSITY; DEFECTS; MASKS;

INSPECTION;

EID: 77953468614     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846922     Document Type: Conference Paper

References (5)

1. Huh, S., Kearney, P., Wurm, S., Goodwin, F., Han, H., Goldberg, K., Mochi, I., Gullikson, E., "EUV actinic defect inspection and defect printability at the sub-32-nm half-pitch," Proceedings of SPIE Vol. 7470, 74700Y (2009).
2. Stefan Wurm, Hakseung Han, Patrick Kearney, Wonil Cho, Chan-Uk Jeon, and Eric Gullikson, Proc. SPIE 6607, 66073A, (2007).
3. Yun, H., Goodwin, F., Huh, S., Orvek, K., Cha, B., Rastegar, A., Kearney, P., "SEMATECH EUVL mask program status," Proceedings of SPIE Vol. 7379, 73790G (2009).
4. K. A. Goldberg, S. B. Rekawa, C. D. Kemp, A. Barty, E. H. Anderson, P. Kearney, H. S. Han, Proc. SPIE 6921, 69213U (2008).
5. Huh, S., Kearney, P., Wurm, S., Rastegar, A., Goodwin, F., Goldberg, K., Mochi, I., Nakajima, T., Kishimoto, M., Komakine, M. "A Study of Real Native Defects on EUV Mask Blanks Using a DUV Blank Inspection Tool and SEMATECH AIT," EUVL Symposium, 2009