Observation of the internal defects of multilayer film

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1015-1018

  Kinoshita, H ^a,c   Hamamoto, K ^b,c   Sakaya, N ^b,c   Hosoya, M ^b,c   Shoki, T ^b,c   Mizuta, Y ^a,c   Yoshizumi, T ^a,c   Tanaka, K ^a,c   Watanabe, T ^a,c  

^a UNIVERSITY OF HYOGO   (Japan)

^b HOYA CORPORATION   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Defect; EUV lithography; EUV microscope; Mask

Indexed keywords

CRYSTAL DEFECTS; EXTREME ULTRAVIOLET LITHOGRAPHY; GLASS; INORGANIC COATINGS; LIGHT REFLECTION; MASKS; SURFACE TOPOGRAPHY;

EXTREME ULTRAVIOLET MICROSCOPE; INTERNAL DEFECTS; PHASE DEFECTS; X RAY ZOOMING TUBES;

MULTILAYER FILMS;

EID: 34247569995     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.139     Document Type: Article

References (9)

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