Step and flash imprint lithography for sub-100 nm patterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 453-457

  Colburn, Matthew ^a   Grot, Annette ^a   Amistoso, Marie ^a   Choi, Byung Jin ^a   Bailey, Todd ^a   Ekerdt, John ^a   Sreenivasan, S V ^a   Hollenhorst, James ^a   Willson, C Grant ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CROSSLINKING; NANOTECHNOLOGY; OPTOELECTRONIC DEVICES; PHOTOPOLYMERIZATION; PHOTORESISTS; PLASTIC COATINGS; REACTIVE ION ETCHING; TITANIUM; ULTRAVIOLET RADIATION;

STEP AND FLASH IMPRINT LITHOGRAPHY (SFIL);

PHOTOLITHOGRAPHY;

EID: 0033698147     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)