Electrical testing of gold nanostructures by conducting atomic force microscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 3, 2000, Pages 1160-1170

  Bietsch, Alexander ^a   Schneider, M Alexander ^b   Welland, Mark E ^b   Michel, Bruno ^a  

^a IBM RESEARCH ZURICH   (Switzerland)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; GOLD; INTEGRATED CIRCUIT TESTING; LITHOGRAPHY; OHMIC CONTACTS; SPUTTER DEPOSITION;

CONDUCTING ATOMIC FORCE MICROSCOPY;

NANOSTRUCTURED MATERIALS;

EID: 0034188031     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591353     Document Type: Article

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