Deep-ultraviolet contact photolithography

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 95-99

  Goodberlet, James G ^a   Dunn, Bryan L ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; FUSED SILICA; MASKS; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; VAN DER WAALS FORCES;

EMBEDDED AMPLITUDE MASK; PATTERN PLACEMENT ERROR; PATTERN TRANSFER; THIN TRANSPARENT MASK SUBSTRATE;

PHOTORESISTS;

EID: 0034205562     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00272-0     Document Type: Article

References (8)

1. 1. A. Kumar and G. M. Whitesides, Appl. Phys. Lett. 63, 2002 (1993).
2. 2. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett. 67, 3114 (1995)
3. 3. Heinz Schmid, Hans Biebuyck, Bruno Michel, Oliver J. F. Martin, and Nicolas B. Piller, J. Vac. Sci. Technol. B 16, 3422 (1998).
4. 4. Henry I. Smith, Rev. Sci. Instr. 40, 729 (1969).
5. 5. R. J. Blaikie, M. M. Alkaisi, S. J. McNab, D.R.S. Cumming, R. Cheung and D. G. Hasko, Microelec. Eng. 46, 85 (1999).
6. 6. John A. Rogers, Kateri E. Paul, and George M. Whitesides, J. Vac. Sci. Technol. B 16, 88 (1998).
7. 7. Euclid E. Moon, Jawoong Lee, Patrick N. Everett, and Henry I. Smith, J. Vac. Sci. Technol. B 16 3631 (1998).
8. 8. M. D. Levenson, private communication.