Nanolithography using optical contact exposure in the evanescent near field

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 85-88

  Blaikie, R J ^a   Alkaisi, M M ^a   McNab, S J ^a   Cumming, D R S ^a   Cheung, R ^a   Hasko, D G ^b  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; ELECTRON BEAM LITHOGRAPHY; MASKS; METALLIZING; SILICON NITRIDE;

OPTICAL CONTACT EXPOSURE;

PHOTORESISTS;

EID: 0033133109     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00021-0     Document Type: Article

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