Mask fabrication by nanoimprint lithography using anti-sticking layers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3996, Issue , 2000, Pages 244-249

  Schulz, H ^a   Osenberg, F ^a   Engemann, J ^a   Scheer, H C ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; DRY ETCHING; FLUOROCARBONS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MASKS; THERMOPLASTICS; THERMOSETS; X RAY PHOTOELECTRON SPECTROSCOPY;

ANTI-STICKING LAYERS; NANOIMPRINT LITHOGRAPHY;

NANOTECHNOLOGY;

EID: 0033891137     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)