Sub-40 nm pattern replication with +/-20% process latitude by soft contact X-ray lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue I, 1999, Pages 70-78

  Carter, D J D ^a   Smith, Henry I ^a   Rhee, K W ^a   Marrian, C ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NANOTECHNOLOGY; OPTICAL RESOLVING POWER; PHOTORESISTS; POLYMETHYL METHACRYLATES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE STRUCTURES;

SOFT CONTACT X RAY NANOLITHOGRAPHY;

X RAY LITHOGRAPHY;

EID: 0032686695     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351076     Document Type: Conference Paper

References (20)