Pattern transfer: Self-assembled monolayers as ultrathin resists

Microelectronic Engineering

Volumn 32, Issue 1-4 SPEC. ISS., 1996, Pages 255-268

  Xia, Younan ^a   Zhao, Xiao Mei ^a   Whitesides, George M ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

Pattern transfer; Self assembled monolayers (SAMs); Ultrathin resists

Indexed keywords

DEPOSITION; ELECTRON BEAM LITHOGRAPHY; ETCHING; MICROELECTRONICS; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; ULTRATHIN FILMS;

PATTERN TRANSFER;

MONOLAYERS;

EID: 0030231504     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00174-3     Document Type: Article

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