Lithographically induced self-construction of polymer microstructures for resistless patterning

Applied Physics Letters

Volumn 75, Issue 7, 1999, Pages 1004-1006

  Chou, Stephen Y ^a   Zhuang, Lei ^a   Guo, Linjie ^a  

^a Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001577714     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124579     Document Type: Article

References (6)

1. M. Berggren, A. Dodabalapur, R. E. Slusher, Z. Bao, A. Timko, and O. Nalamasu, Electron. Lett. 34, 90 (1998).
2. G. Gu, V. Khalfin, and S. R. Forrest, Appl. Phys. Lett. 73, 2399 (1998).
3. C. C. Wu, J. C. Sturm, R. A. Register, and M. E. Thompson, Appl. Phys. Lett. 69, 3117 (1996).
4. S. Y. Chou and L. Zhuang (unpublished).
5. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett. 67, 3114 (1995); Science 272, 85 (1996).
6. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett. 67, 3114 (1995); Science 272, 85 (1996).