Optical lithography: Introduction

IBM Journal of Research and Development

Volumn 41, Issue 1-2, 1997, Pages 3-6

  Chiu, G L T ^a,b,c,d,e,f   Shaw, J M ^{a,g,h,i,j,k,l,m}  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c UNIVERSITY OF CALIFORNIA   (United States)

^d Polytechnic University   (United States)

^e YALE UNIVERSITY   (United States)

^f Society for Information Display   (United States)

^g IBM RESEARCH   (United States)

^h IBM   (United States)

ⁱ VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY   (United States)

^j MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^k MICHIGAN STATE UNIVERSITY   (United States)

^l IEEE

^m Natl Electronics Mfg Institute

more..

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONICS INDUSTRY; MASKS; RANDOM ACCESS STORAGE; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS;

DYNAMIC RANDOM ACCESS MEMORY (DRAM); WAFER THROUGHPUT;

PHOTOLITHOGRAPHY;

EID: 0030717858     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.411.0003     Document Type: Article

References (13)

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2. D. J. Elliott, Integrated Circuit Fabrication Technology, 2nd edition, McGraw-Hill Book Co., Inc., New York, 1989.
3. L. F. Thompson, C. G. Willson, and M. J. Bowden, Introduction to Microlithography, American Chemical Society, Washington, DC, 1983.
4. T. R. Groves, J. G. Hartley, H. C. Pfeiffer, D. Puisto, and D. K. Bailey, "Electron Beam Lithography Tool for Manufacture of X-Ray Masks," IBM J. Res. Develop. 37, No. 3, 411 (1993).
5. Special issue on X-ray lithography, IBM J. Res. Develop. 37, No. 3 (1993).
6. J. S. Wilczynski, "Optical Step and Repeat Camera with Dark Field Automatic Alignment," J. Vac. Sci. Technol. 16, No. 6, 1929 (1979).
7. D. S. Goodman, "Lithographic Image Simulations," Proc. Microcircuit Eng., Vol. 85, North-Holland Publishing Co., Amsterdam, 1985, p. 355.
8. H. H. Hopkins, "On the Diffraction Theory of Optical Images," Proc. Roy. Soc. (Lond.) A217, 408 (1953).
9. M. Born and E. Wolf, Principles of Optics, 6th Edition, Pergamon Press, Oxford, 1983, p. 526.
10. J. D. Cuthbert, "Optical Projection Printing," Solid State Technol. 20, 59 (1977).
11. E. Reichmanis, "The Chemistry of Polymers for Microlithographic Applications," Polymers for Electronic and Photonic Applications, C. P. Wong, Ed., Academic Press, Inc., San Diego, 1993.
12. G. W. Jones, J. M. Shaw, and D. E. Barr, "Lithography in Electronic Packaging," Principles of Electronic Packaging, D. P. Seraphim, R. Lasky, and C.-Y. Li, Eds., McGraw-Hill Book Co., Inc., New York, 1989.
13. R. Srinivasan and B. Braren, "Ultraviolet Laser Ablation of Organic Polymers," Chem. Rev. 37, 1303 (1989).