Prototyping of masks, masters, and stamps/molds for soft lithography using an office printer and photographic reduction

Analytical Chemistry

Volumn 72, Issue 14, 2000, Pages 3176-3180

  Deng, Tao ^a   Wu, Hongkai ^a   Brittain, Scott T ^a   Whitesides, George M ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIMETICONE;

ARTICLE; DEVICE; IMAGE PROCESSING; MASK; PHOTOGRAPHY; PRINTING; ULTRAVIOLET RADIATION;

EID: 0034661892     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac991343m     Document Type: Article

References (24)

1. The edge roughness of the lines is defined as the maximal variation of the lateral dimensions of the lines.
2. Kopp, M. U.; Mello, A. J. D.; Manz, A. Science 1998, 280, 1046.
3. Kovacs, G.; Petersen, K.; Albin. M. Anal. Chem. 1996, 68. 407.
4. Macdonald, N. Microelectron. Eng. 1996, 32, 49.
5. Qin, D.; Xia, Y.; Rogers, J. A.; Jackman, R J.; Zhao, X.-M.; Whitesides, G. M. In Microfabrication, Microstructures and Microsystems; Manz, A., Becker, H., Eds.; Springer-Verlag: Berlin, 1998; Vol. 194.
6. Elliott, D. J. Integrated Circuit Mask Technology, McGraw-Hill: New York, 1985.
7. Qin, D.; Xia, Y.; Whitesides, G. M. Adv. Mater. 1996, 8, 917.
8. Xia, Y.; Whitesides, G. M. Angew. Chem., Int. Ed. 1998, 37, 550.
9. We have also tried printers with 5000 dpi resolution, but the resolution we obtained was indistinguishable from that generated using a 3387 dpi printer.
10. Deng, T.; Tien, J.; Xu, B.; Whitesides, G. M. Langmuir 1999, 75, 6575.
11. Keller, K. Science and Technology of Photography, VCH: Weinheim, Germany, 1993.
12. New England Micrographics, Manchester, NH.
13. Headway Spinner, model PWM 101; Headway Research, Inc., Garland, TX.
14. Kumar, A.; Biebuyck, H. A.; Whitesides, G. M. Langmuir 1994, 10, 1498.
15. Jackman, R.; Wilbur, J.; Whitesides, G. M. Science 1995, 269, 664.
16. Kim, E.; Xia, Y.; Whitesides, G. M. Nature 1995, 376, 581.
17. Zhao, X.-M; Xia, Y.; Whitesides, G. M. Adv. Mater. 1996, 8, 837.
18. Tien, J.; Xia, Y.; Whitesides, G. M. In Microcontact Printing of SAMs; Ulman, A., Ed.; Academic Press: London, U.K., 1998; Vol. 24.
19. The thinnest lines are continuous and have line widths that vary no more than 10% from the designed line widths.
20. Because of the different scales of the patterns, we had to use different microscopes.
21. The lateral dimensions of the smallest squares and circles vary no more than 10%, from the designed dimensions.
22. Lide, D. R. CRC Handbook of Chemistry and Physics; CRC Press: New York, 1999.
23. We are continuing to develop procedures that minimize the equipment used in making stamps/molds.
24. Advance Reproductions Corp.,North Andover, MA: http://www.advancere-pro.com.