메뉴 건너뛰기




Volumn 15, Issue 4, 1999, Pages 1182-1191

Microcontact Printing of Alkanephosphonic Acids on Aluminum: Pattern Transfer by Wet Chemical Etching

Author keywords

[No Author keywords available]

Indexed keywords

ACETIC ACID; ALUMINA; CAPACITANCE; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC RESISTANCE MEASUREMENT; ETCHING; NITRIC ACID; PHOSPHORIC ACID; SILICON NITRIDE; SILICON WAFERS;

EID: 0033075199     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la981094h     Document Type: Article
Times cited : (117)

References (50)
  • 28
    • 85088810471 scopus 로고    scopus 로고
    • 3COOH = 4.74
    • 3COOH = 4.74.
  • 33
    • 2242449481 scopus 로고    scopus 로고
    • note
    • The e-beam we used to achieve uniform aluminum film thickness (see substrate preparation section) was located in the Technology Research Laboratory at MIT, and this is a regulated cleanroom. The use of PDMS was not permitted in this facility, and additionally, we were not permitted to bring in samples that had been processed with PDMS outside of the clean room.
  • 35
    • 2242441478 scopus 로고    scopus 로고
    • This error in dimensions could have been due to inadequate exposure times or inherent limitations of the thick resist used in this step
    • This error in dimensions could have been due to inadequate exposure times or inherent limitations of the thick resist used in this step.
  • 38
    • 2242422449 scopus 로고    scopus 로고
    • This result might be due to a stronger interaction of the phnsphonic acid headgroup with the oxidized stamp, as compared to the hydrophobic, untreated stamp
    • This result might be due to a stronger interaction of the phnsphonic acid headgroup with the oxidized stamp, as compared to the hydrophobic, untreated stamp
  • 39
    • 2242490630 scopus 로고    scopus 로고
    • note
    • The rinsing step was employed in order to obtain SEM images of the patterned surface. The etched films after rinsing, followed by baking, contained many defects and exhibited a decrease in aluminum thickness. There appeared to be a correlation between the rinsing time and the quality of the etched samples: samples that were rinsed for 10 3 contained fewer defects than those rinsed for 30 s. We did not investigate this behavior further because, in all cases, the rinsed samples contained too many defects to be useful.
  • 40
    • 2242437781 scopus 로고    scopus 로고
    • note
    • The initial baking time chosen was 10 mm. Subsequent studies varied the baking time; there was no observable change in pattern definition, line width, or aluminum thickness after etching for samples which had been baked a minimum of l min.
  • 42
    • 2242458290 scopus 로고    scopus 로고
    • Materials Safety Data Sheet for Aluminum Etchant Type "A", Transene Co. Inc., Danvers Industrial Park, 10 Electronics Avenue, Danvers, MA 01923
    • Materials Safety Data Sheet for Aluminum Etchant Type "A", Transene Co. Inc., Danvers Industrial Park, 10 Electronics Avenue, Danvers, MA 01923.
  • 43
    • 85088809817 scopus 로고    scopus 로고
    • note
    • 31 to quantify the size and number of our defects because the etch solution used in that study is also an etchant for aluminum.
  • 50
    • 2242463711 scopus 로고    scopus 로고
    • Caution: Piranha solution is an extremely strong oxidant and should be handled with care
    • Caution: Piranha solution is an extremely strong oxidant and should be handled with care.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.