Energy flow in light-coupling masks for lensless optical lithography

Optics Express

Volumn 3, Issue 7, 1998, Pages 280-285

  Martin, Olivier J F ^a   Piller, Nicolas B ^a   Schmid, Heinz ^b   Biebuyck, Hans ^b   Michel, Bruno ^b  

^a ETH ZURICH   (Switzerland)

^b IBM RESEARCH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT PROPAGATION; LIGHT SCATTERING; MASKS; MICROOPTICS; MICROSTRUCTURE;

ELECTROMAGNETIC THEORY; LIGHT COUPLING MASKS (LCM); MICROSTRUCTURE FABRICATION;

PHOTORESISTS;

EID: 0000667616     PISSN: 10944087     EISSN: None     Source Type: Journal    
DOI: 10.1364/OE.3.000280     Document Type: Article

References (8)

1. H. Schmid, H. Biebuck, B. Michel and O.J.F. Martin, "Light-coupling masks for lensless, sub-wavelength optical lithography," Appl. Phys. Lett. 72, 2379-2381 (1998).
2. H. Schmid, H. Biebuck, B. Michel, O.J.F. Martin and N.B. Piller, "Light-coupling masks: an alternative, lensless approach to high-resolution optical contact lithography," J. Vac. Sci. Technol. B in press (1998).
3. Special issue on optical lithography, IBM J. Res. Develop. 41(1/2) (1997).
4. H.A. Biebuyck, N.B. Larsen, E. Delamarche and B. Michel, "Lithography beyond light: micro-contact printing with monolayer resists," IBM J. Res. Develop. 41, 159-170 (1997).
5. N.B. Piller and O.J.F. Martin, "Increasing the performances of the coupled-dipole approximation: A spectral approach," IEEE Trans. Antennas Propag. 48, 1128-1137 (1998).
6. O.J.F. Martin and N.B. Piller, "Electromagnetic scattering in polarizable backgrounds," Phys. Rev. E 58, 3909-3915 (1998).
7. Olivier J.F. Martin home page: http://www.ifh.ee.ethz.ch/~martin
8. IBM Zurich Research Laboratory home page: http://www.zurich.ibm.com