Mold-assisted near-field optical lithography

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 69-72

  Chen, Y ^a   Carcenac, F ^a   Ecoffet, C ^b   Lougnot, D J ^b   Launois, H ^a  

^a CNRS   (France)

^b UNIVERSITÉ DE HAUTE ALSACE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; FUSED SILICA; MASKS; MONOMERS; PLASTICS MOLDING; REACTIVE ION ETCHING; THIN FILMS;

MOLD-ASSISTED NEAR-FIELD OPTICAL LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0033133108     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00017-9     Document Type: Article

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