Near-field distribution in light-coupling masks for contact lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3314-3317

  Paulus, Michael ^a,b   Michel, Bruno ^b   Martin, Olivier J F ^a  

^a ETH ZURICH   (Switzerland)

^b IBM RESEARCH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033265204     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591002     Document Type: Article

References (11)

1. E. Cullmann, Semicond. Int. 8, 332 (1985).
2. Speeial issue on Optical Lithography, IBM J. Res. Devel. 41 (1997).
3. H. Schmid, H. Biebuyck, B. Michel, and O. J. F. Martin, Appl. Phys. Lett. 72, 2379 (1998).
4. H. Schmid and B. Michel, Macromolecules (submitted).
5. H. Schmid, H. Biebuyck, B. Michel, O. J. F. Martin, and N. B. Piller, J. Vac. Sci. Technol. B 16, 3422 (1998).
6. J. A. Rodgers, K. E. Paul, R. J. Jackman, and G. M. Whitesides, Appl. Phys. Lett. 70, 2658 (1997).
7. J. Aizenberg, J. A. Rodgers, K. E. Paul, and G. M. Whitesides, Appl. Opt. 37, 2145 (1998).
8. O. J. F. Martin and N. Piller, Phys. Rev. E 58, 3909 (1998).
9. J. Randall, H. Gangala, and A. Tritchkov, Microelectron. Eng. 46, 59 (1999).
10. T. A. Brunner and R. A. Ferguson, Solid State Technol. 39, 95 (1996).
11. O. J. F. Martin, N. B. Piller, H. Schmid, H. Biebuyck, and B. Michel, Opt. Express 3, 280 (1998).