Multilayer integrated film bulk acoustic resonators

Multilayer Integrated Film Bulk Acoustic Resonators

Volumn 9783642317767, Issue , 2013, Pages 1-152

  Zhang, Yafei ^a   Chen, Da ^b  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b SHANDONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC EQUIPMENT; ELECTRON DEVICES; FILMS; INTEGRATED CIRCUITS; MICROELECTRONICS; MULTILAYERS; OPTICAL MULTILAYERS;

DEVICE THEORY; ELECTRONIC DEVICE; FABRICATION TECHNOLOGIES; FILM BULK ACOUSTIC RESONATORS; MICRO-ELECTRONIC DEVICES; MULTI-LAYER INTEGRATION; SENSORS AND ACTUATORS; VERY HIGH FREQUENCY;

ACOUSTIC RESONATORS;

EID: 84949177873     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1007/978-3-642-31776-7     Document Type: Book

References (100)

1. Bennett, H.S., Brederlow, R., Costa, J.C., Cottrell, P.E., Huang, W.M., Immorlica Jr., A.A., Mueller, J.E., Racanelli, M., Shichijo, H., Weitzel, C.E., Zhao, B.: Device and technology evolution for Si-based RF integrated circuits. IEEE Trans. Electron Devices 52(7), 1235-1258 (2005)
2. Nguyen, C.T.: MEMS technology for timing and frequency control. IEEE Trans. Ultrason. Ferroelectr. Freq. Control 54(2), 251-270 (2007)
3. Auciello, O., Saha, S., Kaufman, D.Y., Streiffer, S.K., Fan, W., Kabius, B., Im, J., Baumann, P.: Science and technology of high dielectric constant thin films and materials integration for application to high frequency devices. J. Electroceram. 12(1-2), 119-131 (2004)
4. Lakin, K.M., Kline, G.R., McCarron, K.T.: Thin film bulk acoustic wave filters for GPS. Proc. IEEE Ultrason. Symp. 1, 471-476 (1992)
5. Lucyszyn, S.: Review of radio frequency microelectromechanical systems technology. IEE Proc. Sci. Meas. Technol. 151(2), 93-103 (2004)
6. Satoh, Y., Nishihara, T., Yokoyama, T., Ueda, M., Miyashita, T.: Development of piezoelectric thin film resonator and its impact on future wireless communication systems. Jpn. J. Appl. Phys. 44(5A), 2883-2894 (2005)
7. Lakin, K.M.: Thin film resonators and filters. IEEE Ultrason. Symp. Proc. 2, 895-906 (1999)
8. Su, Q.X., Kirby, P., Komuro, E., Imura, M., Zhang, Q., Whatmore, R.: Thin-film bulk acoustic resonators and filters using ZnO and lead-zirconium-titanate thin films. IEEE Trans. Microw. Theory Tech. 49(4), 769-778 (2001)
9. Xu, W., Zhang, X., Choi, S., Chae, J.: A high-quality-factor film bulk acoustic resonator in liquid for biosensing applications. J. Microelectromech. Syst. 20(1), 213-220 (2011)
10. Zhang, H., Pang, W., Marma, M.S., Lee, C.-Y., Kamal-Bahl, S., Kim, E.S., McKenna, C.E.: Label-free detection of protein-ligand interactions in real time using micromachined bulk acoustic resonators. Appl. Phys. Lett. 96(12), 123702-123701-123702-123705 (2010)
11. Nirschl, M., Blleer, A., Erler, C., Katzschner, B., Vikholm-Lundin, I., Auer, S., Vertwl, J., Pompe, W., Schreiter, M., Mertig, M.: Film bulk acoustic resonators for DNA and protein detection and investigation of in vitro bacterial S-layer formation. Sens. Actuators A 156(1), 180-184 (2009)
12. Sauerbrey, G.Z.: The use of quartz crystal oscillators for weighing thin layers and for micro-weighing. Zeitschrift für Physik 155, 206-222 (1959)
13. Penza, M., Aversa, P., Cassano, G., Suriano, D., Wlodarski, W., Benetti, M., Cannatà, D., Pietrantonio, F.D., Verona, E.: Thin-film bulk-acoustic-resonator gas sensor functionalized with a nanocomposite Langmuir-Blodgett layer of carbon nanotubes. IEEE Trans. Electron Devices 55(5), 1237-1243 (2008)
14. Wingqvist, G., Bjurstroöm, J., Liljeholm, L., Yantchev, V., Katardjiev, I.: Shear mode AlN thin film electro-acoustic resonant sensor operation in viscous media. Sens Actuators B 123(1), 466-473 (2007)
15. Wingqvist, G., Bjurstroöm, J., Hellgren, A.C., Katardjiev, I.: Immunosensor utilizing a shear mode thin film bulk acoustic sensor. Sens Actuators B 127(1), 248-252 (2007)
16. Wingqvist, G., Anderson, H., Lennartsson, C., Weissbach, T., Yantchev, V., Lloyd Spetz, A.: On the applicability of high frequency acoustic shear mode biosensing in view of thickness limitations set by the film resonance. Biosens. Bioelectron. 24(11), 3387-3390 (2009)
17. Wingqvist, G.: AlN-based sputter-deposited shear mode thin film bulk acoustic resonator (FBAR) for biosensor applications - a review. Surf. Coat. Technol. 205(5), 1279-1286 (2010)
18. Auld, B.A.: Acoustic Fields and Waves in Solids. Artech House, Boston (1985)
19. Rosenbaum, J.F.: Bulk Acoustic Wave Theory and Devices. Artech House, Boston (1992)
20. Rosenbaum, J.F.: Bulk Acoustic Wave Theory and Devices. Artech House, Boston (1992)
21. Chao, M.C., Huang, Z.N., Pao, S.Y., Wang, Z., Lam, C.S.: Modified BVD-equivalent circuit of FBAR by taking electrodes into account. Proc. IEEE Ultrasonics Symp. 1, 973-976 (2002)
22. Valcheva, E., Dimitrov, S., Manova, D., Maändl, S., Alexandrova, S.: AlN nanoclusters formation by plasma ion immersion implantation. Surf. Coat. Technol. 202(11), 2319-2322 (2008)
23. + ion milling characteristics of III-V nitrides. J. Appl. Phys. 76(2), 1210 (1994)
24. Pearton, S.J., Abernathy, C.R., Ren, F., Lothian, J.R., Wisk, P.W., Katz, A., Constantine, C.: Dry etching of thin-film InN, AlN and GaN. Semicondut. Sci. Technol. 8(2), 310 (1993)
25. Pearton, S.J., Abernathy, C.R., Ren, F.: Low bias electron cyclotron resonance plasma etching of GaN, AlN, and InN. Appl. Phys. Lett. 64(17), 2294-2296 (1994)
26. Engelmark, F., Iriarte, G.F., Katardjiev, I.V.: Selective etching of Al/AlN structures for metallization of surface acoustic wave devices. J. Vac. Sci. Technol. B 20(3), 843-848 (2002)
27. Shul, R.J., Willison, C.G., Bridges, M.M., Han, J., Lee, J.W., Pearton, S.J., Abernathy, C.R., Mackenzie, J.D., Donovan, S.M.: High-density plasma etch selectivity for the III-V nitrides. Solid State Electron. 42(12), 2269-2276 (1998)
28. Saito, S., Sugita, K., Tonotani, J.: Effect of CHF3 addition on reactive ion etching of aluminum using inductively coupled plasma. Jpn. J. Appl. Phys. 44(5A), 2971-2975 (2005)
29. Wang, J.S., Chend, Y.Y., Lakin, K.M.: Reactive ion etching of pizeoelectric films for acoustic wave device. In: 1982 Ultrasonics Symposium Proceedings, pp. 25-29 (1982)
30. Prokofyeva, T., Seon, M., Vanbuskirk, J., Holtz, M., Nikishin, S.A., Faleev, N.N., Temkin, H., Zollner, S.: Vibrational properties of AlN grown on (111)-oriented silicon. Phys. Rev. B 63(12), 125313-125317 (2001)
31. Watanabe, M., Mori, Y., Ishikawa, T., Sakai, H., Iida, T., Akiyama, K., Narita, S., Sawabe, K., Shobatake, K.: Thermal reaction of polycrystalline AlN with XeF2. J. Vac. Sci. Technol. A 23(6), 1647-1658 (2005)
32. Bollinger, D., Iida, S., Matsumoto, O.: Reactive ion etching: its basis and future. Part I. Solid State Technol. 27(5), 111-117 (1984)
33. Zhuang, D., Edgar, J.H.: Wet etching of GaN, AIN, and SiC: a review. Mater. Sci. Eng. R 48(1), 1-46 (2005)
34. Bickermann, M., Schmidt, S., Epelbaum, B.M., Heimann, P., Nagata, S., Winnacker, A.: Wet KOH etching of freestanding AlN single crystals. J. Cryst. Growth 300(2), 299-307 (2007)
35. Sheng, T.Y., Yu, Z.Q., Collins, G.J.: Disk hydrogen plasma assisted chemical vapor deposition of aluminum nitride. Appl. Phys. Lett. 52(7), 576-578 (1988)
36. Mileham, J.R., Pearton, S.J., Abernathy, C.R., MacKenzie, J.D., Shul, R.J., Kilcoyne, S.P.: Wet chemical etching of AlN. Appl. Phys. Lett. 67(8), 1119-1121 (1995)
37. Zhuang, D., Edgar, J.H., Strojek, B., Chaudhuri, J., Rek, Z.: Defect-selective etching of bulk AlN single crystals in molten KOH/NaOH eutectic alloy. J. Cryst. Growth 262(1-4), 89-94 (2004)
38. Ababneh, A., Kreher, H., Schmid, U.: Etching behaviour of sputter-deposited aluminium nitride thin films in H3PO4 and KOH solutions. Microsyst. Technol. 24(6), 1-7 (2008)
39. Jung, W.L., Jerome, J.C., Mohamed, B.: Plasma characteristics in pulsed direct current reactive magnetron sputtering of aluminum nitride thin films. J. Vac. Sci. Technol. A 22(2), 260-263 (2004)
40. Vartuli, C.B., Pearton, S.J., Lee, J.W., Abernathy, C.R., Mackenzie, J.D., Zolper, J.C., Shul, R.J., Ren, F.: Wet chemical etching of AlN and InAlN in KOH solutions. J. Electrochem. Soc. 143(11), 3681-3684 (1996)
41. 2 thin film deposited onto glass by DC magnetron sputtering. Thin Solid Films 392(2), 338-344 (2001)
42. Chen, H.T., Wu, X.L., Xiong, X., Zhang, W.C., Xu, L.L., Zhu, J., Chu, P.K.: Formation mechanism and photoluminescence of AlN nanowhiskers. J. Phys. D: Appl. Phys. 41(2), 758-764 (2008)
43. Sivanandan, K., Achuthan, A.T., Kumar, V., Kanno, I.: Fabrication and transverse piezoelectric characteristics of PZT thick-film actuators on alumina substrates. Sens. Actuators A Phys. 148(1), 134-137 (2008)
44. Kao, Y.H., Lin, J.H., Kang, N.Y., Liu, Y.N.: A 2.5 GHz voltage controlled oscillator with film bulk acoustic resonator. In: 2007 International Conference on Microwave and Millimeter Wave Technology, ICMMT'07, pp. 89-93 (2007)
45. Ruby, R.: Review and comparison of bulk acoustic wave FBAR, SMR technology. In: Proceedings - IEEE Ultrasonics Symposium, pp. 1029-1040. New York, NY (2007)
46. Kerherve, E., Ancey, P., Aid, M., Kaiser, A.: BAW technologies: development and applications within MARTINA, MIMOSA and MOBILIS IST European projects. In: Proceedings - IEEE Ultrasonics Symposium, pp. 341-350. Vancouver, BC (2006)
47. Yim, M., Kim, D.H., Chai, D., Yoon, G.: Effects of thermal annealing of W/SiO2 multilayer Bragg reflectors on resonance characteristics of film bulk acoustic resonator devices with cobalt electrodes. J. Vac. Sci. Technol. A Vac. Surf. Films 22(3), 465-471 (2004)
48. Corso, C.D., Dickherber, A., Hunt, W.D.: Lateral field excitation of thickness shear mode waves in a thin film ZnO solidly mounted resonator. J. Appl. Phys. 101(5), 054514-054517 (2007)
49. Satoh, Y., Nishihara, T., Yokoyama, T., Ueda, M., Miyashita, T.: Development of piezoelectric thin film resonator and its impact on future wireless communication systems. Jpn. J. Appl. Phys. 44(5A), 2883-2894 (2005)
50. Zavada, J.M., Nepal, N., Lin, J.Y., Jiang, H.X., Brown, E., Hommerich, U., Hite, J., Thaler, G.T., Abernathy, C.R., Pearton, S.J., Gwilliam, R.: Ultraviolet photoluminescence from Gd-implanted AlN epilayers. Appl. Phys. Lett. 89(15), 157-162 (2006)
51. Tonisch, K., Cimalla, V., Foerster, C., Romanus, H., Ambacher, O., Dontsov, D.: Piezoelectric properties of polycrystalline AlN thin films for MEMS application. Sens. Actuators A 132(2), 658-663 (2006)
52. Heinze, H., Schmidhammer, E., Diekmann, C, Metzger, T.: 3.8 × 3.8 mm2 PCS-CDM a duplexer incorporating thin film resonator technology. In: Proceedings - IEEE Ultrasonics Symposium, pp. 425-428. Montréal, Canada (2004)
53. Aberg, M., Ylimaula, M., Ylilammi, M., Pensala, T., Rantala, A.: A low noise 0.9 GHz FBAR clock. Analog Integr. Circuits Signal Process. 50(1), 29-37 (2007)
54. Vanhelmont, F., Philippe, P., Jansman, A.B.M., Milsom, R.F., Ruigrok, J.J.M., Oruk, A.: A 2 GHz reference oscillator incorporating a temperature compensated BAW resonator. In: Proceedings - IEEE Ultrasonics Symposium, pp. 333-336. Vancouver, Canada (2006)
55. Kao, Y.H., Lin, J.H., Kang, N.Y., Liu, Y.N.: A 2.5 GHz voltage controlled oscillator with film bulk acoustic resonator. In: 2007 International Conference on Microwave and Millimeter Wave Technology, ICMMT07, pp. 89-93. Builin (2007)
56. Zhang, H, Kim, J., Pang, W., Yu, H., Kim, E.S.: 5 GHz low-phase-noise oscillator based on FBAR with low TCF. In: Digest of Technical Papers - International Conference on Solid State Sensors and Actuators and Microsystems, TRANSDUCERS'05, pp. 1100-1101. Seoul, South Korea (2005)
57. Larson III, J.D.: A BAW antenna diplexer for the 1900 MHz PCS band. In: IEEE Ultrasonics Symposium, pp. 863-868. Caribe Hilton (2000)
58. Piazza, G., Stephanou, P.J., Black, J.P., White, R.M., Pisano, A.P.: Single-chip multiple-frequency RF microresonators based on aluminum nitride contour-mode and FBAR technologies. In: Proceedings - IEEE Ultrasonics Symposium, pp. 1187-1190. Rotterdam, Holland (2005)
59. Schmidhammer, E., Bader, B., Sauer, W, Schmiedgen, M., Heinze, H., Eggs, C, Metzger, T: Design flow and methodology on the design of BAW components. In: IEEE MTT-S International Microwave Symposium Digest, pp. 233-236. Long Beach, CA (2005)
60. Carlotti, G., Gubbiotti, G., Hickernell, F.S., Liaw, H.M., Socino, G.: Comparative study of the elastic properties of polycrystalline aluminum nitride films on silicon by Brillouin light scattering. Thin Solid Films 310(1-2), 34-38 (1997)
61. Fardeheb-Mammeri, A., Assouar, M.B., Elmazria, O., Fundenberger, J.J., Benyoucef, B.: Growth and characterization of c-axis inclined AlN films for shear wave devices. Semicondut. Sci. Technol. 23(9), 55-61 (2008)
62. Weber, J., Albers, W.M., Tuppurainen, J., Link, M., Gabl, R., Wersing, W., Schreiter, M.: Shear mode FBARs as highly sensitive liquid biosensors. Sens. Actuators A Phys. 128(1), 84-88 (2006)
63. Gerlich, D., Dole, S.L., Slack, G.A.: Elastic properties of aluminum nitride. J. Phys. Chem. Solids 47(5), 437-441 (1986)
64. Sauerbrey, G.Z.: The use of quartz crystal oscillators for weighing thin layers and for micro-weighing. Z. Phys. 155, 206-222 (1959)
65. Wingqvist, G., Bjurstroöm, J., Hellgren, A.C., Katardjiev, I.: Immunosensor utilizing a shear mode thin film bulk acoustic sensor. Sens. Actuators B 127(1), 248-252 (2007)
66. Kurosawa, S., Park, J.W., Aizawa, H., Wakida, S.I., Tao, H., Ishihara, K.: Quartz crystal microbalance immunosensors for environmental monitoring. Biosens. Bioelectron. 22(4 SPEC. ISS.), 473-481 (2006)
67. Consales, M., Cutolo, A., Penza, M., Aversa, P., Cassano, G., Giordano, M., Cusano, A.: Carbon nanotubes coated acoustic and optical VOCs sensors: towards the tailoring of the sensing performances. IEEE Trans. Nanotechnol. 6(6), 601-611 (2007)
68. Zhang, T., Mubeen, S., Myung, N.V., Deshusses, M.A.: Recent progress in carbon nanotube-based gas sensors. Nanotechnology 19(33), 12547-12550 (2008)
69. Lucci, M., Toschi, F., Sessa, V., Orlanducci, S., Tamburri, E., Terranova, M.L.: Quartz Crystal Nano-balance for hydrogen sensing at room temperature using carbon nanotubes aggregates. In: Proceedings of SPIE - The International Society for Optical Engineering (2007)
70. Li, W., Hoa, N.D., Kim, D.: High-performance carbon nanotube hydrogen sensor. Sens. Actuators B Chem. 149(1), 184-188 (2010)
71. Penza, M., Tagliente, M.A., Aversa, P., Cassano, G.: Organic-vapor detection using carbon-nanotubes nanocomposite microacoustic sensors. Chem. Phys. Lett. 409(4), 349-354 (2005)
72. Consales, M., Campopiano, S., Cutolo, A., Penza, M., Aversa, P., Cassano, G., Giordano, M., Cusano, A.: Carbon nanotubes thin films fiber optic and acoustic VOCs sensors: performances analysis. Sens Actuators B Chem. 118(1-2), 232-242 (2006)
73. Penza, M., Aversa, P., Cassano, G., Suriano, D., Wlodarski, W., Benetti, M., Cannatà, D., Pietrantonio, F.D., Verona, E.: Thin-film bulk-acoustic-resonator gas sensor functionalized with a nanocomposite Langmuir-Blodgett layer of carbon nanotubes. IEEE Trans. Electron Devices 55(5), 1237-1243 (2008)
74. Goyal, A., Joshi, P., Tadigadapa, S., Gupta, A., Eklund, P.: Micromachined quartz resonator functionalized with single walled carbon nanotubes. In: Proceedings of IEEE Sensors, pp. 841-844 (2005)
75. Zhang, Y., Yu, K., Xu, R., Jiang, D., Luo, L., Zhu, Z.: Quartz crystal microbalance coated with carbon nanotube films used as humidity sensor. Sens. Actuators A Phys. 120(1), 142-146 (2005)
76. Chen, H.W., Wu, R.J., Chan, K.H., Sun, Y.L., Su, P.G.: The application of CNT/Nafion composite material to low humidity sensing measurement. Sens. Actuators B Chem. 104(1), 80-84 (2005)
77. Xie, H., Yang, Q.D., Sun, X., Yu, T., Huang, J.Z., Huang, Y.: Gas sensors based on nanosized-zeolite films to identify dimethylmethylphosphonate. Sens. Mater. 17(1), 21-28 (2005)
78. Su, P.G., Sun, Y.L., Lin, C.C.: A low humidity sensor made of quartz crystal microbalance coated with multi-walled carbon nanotubes/Nafion composite material films. Sens. Actuators B Chem. 115(1), 338-343 (2006)
79. Zhang, H., Marma, M.S., Kim, E.S., McKenna, C.E., Thompson, M.E.: Mercury ion sensing by film-bulk-acoustic-resonator mass sensor. In: Proceedings of IEEE Sensors, pp. 203-206 (2005)
80. Zhang, H., Marma, M.S., Bahl, S.K., Kim, E.S., McKenna, C.E.: Sequence specific label-free DNA sensing using film-bulk-acoustic-resonators. IEEE Sens. J. 7(12), 1587-1588 (2007)
81. Wingqvist, G., Bjurstrom, J., Hellgren, A.C., Katardjiev, I.: Immunosensor utilizing a shear mode thin film bulk acoustic sensor. Sens. Actuators B Chem. 127(1), 248-252 (2007)
82. Wingqvist, G., Bjurstrom, J., Katardjiev, I.: Shear mode AlN thin film electroacoustic resonator for biosensor applications. In: Proceedings - IEEE Ultrasonics Symposium, p. 50 (2005)
83. Wingqvist, G., Bjurstrom, J., Liljeholm, L., Yantchev, V., Katardjiev, I.: Shear mode AlN thin film electro-acoustic resonant sensor operation in viscous media. Sens. Actuators B Chem. 123(1), 466 (2007)
84. Tilmans, H.A.C., De Raedt, W., Beyne, E.: MEMS for wireless communications: 'From RF-MEMS components to RF-MEMS-SiP'. J. Micromech. Microeng. 13(4), S139-S163 (2003)
85. Stetter, J.R., Li, J.: Amperometric gas sensors - a review. Chem. Rev. 108(2), 352-366 (2008)
86. Zhang, H., Kim, E.S.: Micromachined acoustic resonant mass sensor. J. Microelectromech. Syst. 14(4), 699-706 (2005)
87. Reichl, W., Runck, J., Schreiter, M., Green, E., Gabl, R.: Novel gas sensors based on thin film bulk acoustic resonators. In: Proceedings of IEEE Sensors, pp. 1504-1505 (2004)
88. Gabl, R., Feucht, H.-D., Zeininger, H., Eckstein, G., Schreiter, M., Primig, R., Pitzer, D., Wersing, W.: First results on label-free detection of DNA and protein molecules using a novel integrated sensor technology based on gravimetric detection principles. Biosens. Bioelectron. 19(6), 615-620 (2004)
89. Gabl, R., Green, E., Schreiter, M., Feucht, H.D., Zeininger, H., Primig, R., Pitzer, D., Eckstein, G., Wersing, W., Reichl, W., Runck, J.: Novel integrated FBAR sensors: a universal technology platform for bio- and gas-detection. In: Proceedings of IEEE Sensors, pp. 1184-1188 (2003)
90. Augustyniak, M., Weber, W, Beer, G., Mulatz, H., Elbrecht, L., Timme, H.J., Tiebout, M., Simburger, W., Paulus, C., Eversmann, B., Schmitt-Landsiedel, D., Thewes, R., Brederlow, R.: An integrated gravimetric FBAR circuit for operation in liquids using a flip-chip extended 0.13 μm CMOS technology. In: Digest of Technical Papers - IEEE International Solid-State Circuits Conference, pp. 392-393+610+379 (2007)
91. Zhang, H., Marma, M.S., Kim, E.S., McKenna, C.E., Thompson, M.E.: Implantable resonant mass sensor for liquid biochemical sensing. In: Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS), pp. 347-350 (2004)
92. Zhang, H., Marma, M.S., Kim, E.S., McKenna, C.E., Thompson, M.E.: A film bulk acoustic resonator in liquid environments. J. Micromech. Microeng. 15(10), 1911-1916 (2005)
93. Wingqvist, G: AlN-based sputter-deposited shear mode thin film bulk acoustic resonator (FBAR) for biosensor applications - A review. Surf. Coat. Tech. 205(5), 1279-1286 (2010)
94. Wingqvist, G., Yantchev, V., Katardjiev, I.: Mass sensitivity of multilayer thin film resonant BAW sensors. Sens. Actuators B Chem. 248(59), 1258-1263 (2008)
95. Weber, J., Albers, W.M., Tuppurainen, J., Link, M., Gabl, R., Wersing, W, Schreiter, M.: Shear mode FBARs as highly sensitive liquid biosensors. Sens. Actuators A Phys. 128(1), 84-88 (2006)
96. Link, M., Weber, J., Schreiter, M., Wersing, W., Elmazria, O., Alnot, P.: Sensing characteristics of high-frequency shear mode resonators in glycerol solutions. Sens. Actuators B 121(2), 372-378 (2007)
97. Rey-Mermet, S., Lanz, R., Muralt, P.: AlN thin film resonators operating at 8 GHz used as sensors for organic films. In: Proceedings - IEEE Ultrasonics Symposium, pp. 1253-1257 (2005)
98. Loschonsky, M., Eisele, D., Reindl, L.M.: Mass sensitive thin film bulk acoustic wave resonators. In: Proceedings of the IEEE International Frequency Control Symposium and Exposition, pp. 111-116 (2007)
99. Yan, Z., Zhou, X.Y, Pang, G.K.H., Zhang, T, Liu, W.L., Cheng, J.G, Song, Z.T., Feng, S.L., Lai, L.H., Chen, J.Z., Wang, Y: ZnO-based film bulk acoustic resonator for high sensitivity biosensor applications. Appl. Phys. Lett. 90(14), 143503 (2007)
100. Lamers, TL., Fazzio, R.S.: Accelerating development of a MEMS piezoelectric microphone. In: 2007 Proceedings of the ASME International Design Engineering Technical Conferences and Computers and Information in Engineering Conference, DETC2007, pp. 593-601 (2008)