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Thin Solid Films

Volumn 392, Issue 2, 2001, Pages 338-344

Photocatalytic TiO2 thin film deposited onto glass by DC magnetron sputtering

(4) Takeda, Satoshi a Suzuki, Susumu a Odaka, Hidefumi a Hosono, Hideo b

a ASAHI GLASS CO LTD (Japan)

b TOKYO INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

Oxygen vacancy; Photocatalytic activity; Sputtering; TiO2

Indexed keywords

MAGNETRON SPUTTERING; OPTICAL GLASS; PHOTOCATALYSIS; SPUTTER DEPOSITION; THIN FILMS; TITANIUM DIOXIDE;

DIRECT CURRENT MAGNETRON SPUTTERING;

OPTICAL FILMS;

EID: 0035974496 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01054-9 Document Type: Conference Paper

Times cited : (342)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.