Thermal reaction of polycrystalline SiC with XeF2

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 6, 2005, Pages 1638-1646

  Watanabe, Morimichi ^a   Mori, Yukimasa ^a   Sakai, Hiroaki ^a   Iida, Takashi ^b   Koide, Shunsuke ^b   Maeta, Eri ^b   Sawabe, Kyoichi ^b   Shobatake, Kosuke ^b,c  

^a NGK INSULATORS LTD   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

^c TOYOTA PHYSICAL AND CHEMICAL RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON INORGANIC COMPOUNDS; MASS SPECTROMETRY; MOLECULAR BEAMS; REACTION KINETICS; SILICON CARBIDE; TEMPERATURE DISTRIBUTION; X RAY PHOTOELECTRON SPECTROSCOPY; XENON;

SCANNING AUGER MICROSCOPY (SAM); THERMAL REACTION;

POLYCRYSTALLINE MATERIALS;

EID: 31044451914     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2110387     Document Type: Article

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