Understanding the electron-stimulated surface reactions of organometallic complexes to enable design of precursors for electron beam-induced deposition

Applied Physics A: Materials Science and Processing

Volumn 117, Issue 4, 2014, Pages 1631-1644

  Spencer, Julie A ^b   Rosenberg, Samantha G ^b   Barclay, Michael ^b   Wu, Yung Chien ^a   McElwee White, Lisa ^a   Howard Fairbrother, D ^b  

^a University of Florida   (United States)

^b JOHNS HOPKINS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYST ACTIVITY; CONTAMINATION; DEPOSITS; ELECTRON BEAMS; ELECTRONS; LIGANDS; NANOSTRUCTURES; ORGANOMETALLICS; PHOTODISSOCIATION; SURFACE REACTIONS; ULTRAHIGH VACUUM;

CHEMICAL VAPOR DEPOSITIONS (CVD); DISSOCIATIVE ELECTRON ATTACHMENT; ELECTRON BEAM PROCESSING; ELECTRON BEAM-INDUCED DEPOSITION; LOW ENERGY SECONDARY ELECTRONS; ORGANO-METALLIC COMPLEXES; ORGANOMETALLIC PRECURSORS; SURFACE SCIENCE APPROACHES;

CHEMICAL VAPOR DEPOSITION;

EID: 84911805838     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-014-8570-5     Document Type: Article

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