Low-energy electron-induced decomposition and reactions of adsorbed tetrakis(trifluorophosphine)platinum [Pt(PF3)4]

Journal of Physical Chemistry C

Volumn 115, Issue 35, 2011, Pages 17452-17463

  Landheer, Kees ^a   Rosenberg, Samantha G ^b   Bernau, Laurent ^c   Swiderek, Petra ^d   Utke, Ivo ^c   Hagen, Cornelis W ^a   Fairbrother, D Howard ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b JOHNS HOPKINS UNIVERSITY   (United States)

^c SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^d UNIVERSITY OF BREMEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BACKGROUND GAS; BOND CLEAVAGES; CLEAVAGE EVENTS; CO-ORDINATIVELY UNSATURATED; CROSS SECTION; DECOMPOSITION PROCESS; DEPOSITION CONDITIONS; ELECTRON BEAM-INDUCED DEPOSITION; ELECTRON FLUX; GASPHASE; HIGH-RESOLUTION ELECTRON ENERGY LOSS SPECTROSCOPY; IN-SITU; INCIDENT ELECTRONS; INITIAL DEPOSITIONS; LOW ENERGIES; NANOMETER-THICK FILMS; OXYGEN UPTAKE; PHOSPHORUS ATOM; ROOM TEMPERATURE; SECOND PHASE; SUBSTRATE TEMPERATURE; TETRAKIS;

DISSOCIATION; ELECTRON ENERGY LEVELS; ELECTRON IRRADIATION; ELECTRONS; ENERGY DISSIPATION; FLUORINE; GASES; MASS SPECTROMETRY; OXYGEN; PHOSPHORUS; PHOTOELECTRON SPECTROSCOPY; PLATINUM; REACTION INTERMEDIATES; SURFACE REACTIONS; THICK FILMS; WATER VAPOR; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON ENERGY LOSS SPECTROSCOPY;

EID: 80052328279     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp204189k     Document Type: Article

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