Electron postgrowth irradiation of platinum-containing nanostructures grown by electron-beam-induced deposition from Pt (P F3)4

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2759-2763

  Botman, A ^a,c   Hagen, C W ^a   Li, J ^b   Thiel, B L ^b   Dunn, K A ^b   Mulders, J J L ^c   Randolph, S ^c   Toth, M ^c  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b STATE UNIVERSITY OF NEW YORK   (United States)

^c Thermo Fisher Scientific   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION TIME; ELECTRON BEAM-INDUCED DEPOSITION; ELECTRON FLUENCES; FOUR-POINT PROBE; GRAIN SIZE; IN-SITU; SCANNING ELECTRON MICROSCOPE; SELECTED AREA DIFFRACTION;

CHEMICAL VAPOR DEPOSITION; DEPOSITS; ELECTRON BEAMS; ELECTRON IRRADIATION; MICROSTRUCTURE; PLATINUM; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRONS;

EID: 72849124957     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3253551     Document Type: Conference Paper

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