Substrate temperature and electron fluence effects on metallic films created by electron beam induced deposition

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 30, Issue 5, 2012, Pages

  Rosenberg, Samantha G ^a   Landheer, Kees ^b   Hagen, Cornelis W ^b   Fairbrother, D Howard ^a  

^a JOHNS HOPKINS UNIVERSITY   (United States)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION; ELECTRON BEAMS; LIGANDS; PHOSPHORUS; PHOTOELECTRONS; PLATINUM; SOLAR CELL ARRAYS; SUBSTRATES; TUNGSTEN; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL COMPOSITIONS; CO LIGANDS; DECOMPOSITION MECHANISM; DIFFERENT PRECURSORS; ELECTRON BEAM-INDUCED DEPOSITION; ELECTRON FLUENCES; FILM PROPERTIES; METAL CONTENT; PROCESSING VARIABLES; STIMULATED PROCESS; SUBSTRATE TEMPERATURE; SURFACE SCIENCE; SURFACE-BOUND INTERMEDIATES;

REACTION INTERMEDIATES;

EID: 84866488107     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.4751281     Document Type: Article

References (45)

1. W. F. van Dorp and C. W. Hagen, J. Appl. Phys. 104, 081301 (2008). 10.1063/1.2977587
2. S. J. Randolph, J. D. Fowlkes, and P. D. Rack, Crit. Rev. Solid State Mater. Sci. 31, 55 (2006). 10.1080/10408430600930438
3. I. Utke, P. Hoffman, and J. Melngailis, J. Vac. Sci. Technol. B 26, 1197 (2008). 10.1116/1.2955728
4. N. Silvis-Cividjian, C. W. Hagen, P. Kruit, M. A. v.d. Stam, and H. B. Groen, Appl. Phys. Lett. 82, 3514 (2003). 10.1063/1.1575506
5. A. Botman, M. Hesselberth, and J. J. L. Mulders, J. Vac. Sci. Technol. B 26, 2464 (2008). 10.1116/1.2990790
6. A. Botman, J. J. L. Mulders, R. Weemaes, and S. Mentink, Nanotechnology 17, 3779 (2006). 10.1088/0957-4484/17/15/028
7. M. Takeguchi, M. Shimojo, and K. Furuya, Appl. Phys. A 93, 439 (2008). 10.1007/s00339-008-4851-1
8. A. Botman, M. Hesselberth, and J. J. L. Mulders, Microelectron. Eng. 85, 1139 (2008). 10.1016/j.mee.2007.12.036
9. J. Li, M. Toth, V. Tileli, K. A. Dunn, C. J. Lobo, and B. L. Thiel, Appl. Phys. Lett. 93, 023130 (2008). 10.1063/1.2959112
10. P. C. Hoyle, J. R. A. Cleaver, and H. Ahmed, J. Vac. Sci. Technol. B 14, 662 (1996). 10.1116/1.589154
11. J. Barry, M. H. Ervin, J. Molstad, A. Wickenden, T. Brintlinger, P. Hoffman, and J. Meingailis, J. Vac. Sci. Technol. B 24, 3165 (2006). 10.1116/1.2395962
12. K. T. Kohlmann-von Platen, L. M. Buchmann, H. C. Petzold, and W. H. Brunger, J. Vac. Sci. Technol. B 10, 2690 (1992). 10.1116/1.586027
13. H. W. P. Koops, C. Schossler, A. Kaya, and M. Weber, J. Vac. Sci. Technol. B 14, 4105 (1996). 10.1116/1.588600
14. S. Wang, Y.-M. Sun, Q. Wang, and J. M. White, J. Vac. Sci. Technol. B 22, 1803 (2004). 10.1116/1.1761266
15. J. J. L. Mulders, L. M. Belova, and A. Riazanova, Nanotechnology 22, 055302 (2011). 10.1088/0957-4484/22/5/055302
16. J. D. Wnuk, J. M. Gorham, S. G. Rosenberg, W. F. van Dorp, T. E. Madey, C. W. Hagen, and D. H. Fairbrother, J. Phys. Chem. C 113, 2487 (2009). 10.1021/jp807824c
17. J. D. Wnuk, J. M. Gorham, S. G. Rosenberg, W. F. van Dorp, T. E. Madey, C. W. Hagen, and D. H. Fairbrother, J. Appl. Phys. 107, 054301 (2010). 10.1063/1.3295918
18. J. D. Wnuk, S. G. Rosenberg, J. M. Gorham, W. F. van Dorp, C. W. Hagen, and D. H. Fairbrother, Surf. Sci. 605, 257 (2011). 10.1016/j.susc.2010.10.035
19. K. Landheer, S. G. Rosenberg, L. Bernau, P. Swiderek, I. Utke, C. W. Hagen, and D. H. Fairbrother, J. Phys. Chem. C 115, 17452 (2011). 10.1021/jp204189k
20. 6, Phys. Chem. Chem. Phys. (submitted).
21. M. H. Ervin, D. Chang, B. Nichols, A. Wickenden, J. Barry, and a. Melngailis, J. Vac. Sci. Technol. B 25, 2250 (2007). 10.1116/1.2806978
22. A. Botman, D. A. M. de Winter, and J. J. L. Mulders, J. Vac. Sci. Technol. B 26, 2460 (2008). 10.1116/1.2976576
23. H. Schroder, K. L. Kompa, D. Masci, and I. Gianinoni, Appl. Phys. A 38, 227 (1985). 10.1007/BF00616501
24. I. Sychugov, Y. Nakayama, and K. Mitsuishi, J. Phys. Chem. C 113, 21516 (2009). 10.1021/jp9079684
25. W. F. van Dorp, B. van Someren, C. W. Hagen, P. Kruit, and P. A. Crozier, J. Vac. Sci. Technol. B 24, 618 (2006). 10.1116/1.2170099
26. W. F. van Dorp, C. W. Hagen, P. A. Crozier, and P. Kruit, Nanotechnology 19, 225305 (2008). 10.1088/0957-4484/19/22/225305
27. F. Porrati, R. Sachser, and M. Huth, Nanotechnology 20, 195301 (2009). 10.1088/0957-4484/20/19/195301
28. H. W. P. Koops, R. Weiel, D. P. Kern, and T. H. Baum, J. Vac. Sci. Technol. B 6, 477 (1988). 10.1116/1.584045
29. S. Frabboni, G. C. Gazzadi, L. Felisari, and A. Spessot, Appl. Phys. Lett. 88, 213116 (2006). 10.1063/1.2206996
30. S. Frabboni, G. C. Gazzadi, and A. Spessot, Physica E: Low-Dimens. Syst. Nanostruct. 37, 265 (2007). 10.1016/j.physe.2006.06.018
31. W. F. van Dorp, J. D. Wnuk, J. M. Gorham, D. H. Fairbrother, T. E. Madey, and C. W. Hagen, J. Appl. Phys. 106, 074903 (2009). 10.1063/1.3225091
32. P. D. Rack, S. J. Randolph, Y. Deng, J. D. Fowlkes, Y. Choi, and D. C. Joy, Appl. Phys. Lett. 82, 2326 (2003). 10.1063/1.1565696
33. J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, Handbook of X-ray Photoelectron Spectroscopy (Physical Electronics USA, Inc., Chanhassen, 1995).
34. S. Tanuma, C. J. Powell, and D. R. Penn, Surf. Interface Anal. 17, 911 (1991). 10.1002/sia.740171304
35. M. J. Rand, J. Electrochem. Soc. 120, 686 (1973). 10.1149/1.2403534
36. F. Zaera, J. Phys. Chem. 96, 4609 (1992). 10.1021/j100190a086
37. M. A. Henderson, R. D. Ramsier, and J. T. Yates, J. Vac. Sci. Technol. A 9, 1563 (1991). 10.1116/1.577662
38. M. A. Henderson, R. D. Ramsier, and J. T. Yates, Surf. Sci. 259, 173 (1991). 10.1016/0039-6028(91)90535-Z
39. R. D. Ramsier, M. A. Henderson, and J. T. Yates, Surf. Sci. 257, 9 (1991). 10.1016/0039-6028(91)90774-M
40. C. Hauchard, C. Pepin, and P. Rowntree, Langmuir 21, 9166 (2005). 10.1021/la050678y
41. E. Umbach and D. Menzel, Surf. Sci. 135, 199 (1983). 10.1016/0039- 6028(83)90219-4
42. H. W. Koops, A. Kaya, and M. Weber, J. Vac. Sci. Technol. B 13, 2400 (1995). 10.1116/1.588008
43. F. Porrati, R. Sachser, C. H. Schwalb, A. S. Frangakis, and M. Huth, J. Appl. Phys. 109, 063715 (2011). 10.1063/1.3559773
44. A. Botman, C. W. Hagen, J. Li, B. L. Thiel, K. A. Dunn, J. J. L. Mulders, S. J. Randolph, and M. Toth, J. Vac. Sci. Technol. B 27, 2759 (2009). 10.1116/1.3253551
45. J. T. Li, M. Toth, K. A. Dunn, and B. L. Thiel, J. Appl. Phys. 107, 103540 (2010). 10.1063/1.3428427