-
2
-
-
33750206624
-
Focused, nanoscale electron-beam-induced deposition and etching
-
DOI 10.1080/10408430600930438, PII L640117724864M52
-
S. J. Randolph, J. D. Fowlkes, and P. D. Rack, Crit. Rev. Solid State Mater. Sci. 1040-8436 31, 55 (2006). 10.1080/10408430600930438 (Pubitemid 44603985)
-
(2006)
Critical Reviews in Solid State and Materials Sciences
, vol.31
, Issue.3
, pp. 55-89
-
-
Randolph, S.J.1
Fowlkes, J.D.2
Rack, P.D.3
-
3
-
-
49749114396
-
-
1071-1023,. 10.1116/1.2955728
-
I. Utke, P. Hoffman, and J. Melngailis, J. Vac. Sci. Technol. B 1071-1023 26, 1197 (2008). 10.1116/1.2955728
-
(2008)
J. Vac. Sci. Technol. B
, vol.26
, pp. 1197
-
-
Utke, I.1
Hoffman, P.2
Melngailis, J.3
-
4
-
-
55249089714
-
-
0021-8979,. 10.1063/1.2977587
-
W. F. van Dorp and C. W. Hagen, J. Appl. Phys. 0021-8979 104, 081301 (2008). 10.1063/1.2977587
-
(2008)
J. Appl. Phys.
, vol.104
, pp. 081301
-
-
Van Dorp, W.F.1
Hagen, C.W.2
-
5
-
-
43249104389
-
Growth behavior near the ultimate resolution of nanometer-scale focused electron beam-induced deposition
-
DOI 10.1088/0957-4484/19/22/225305, PII S0957448408673110
-
W. F. van Dorp, C. W. Hagen, P. A. Crozier, and P. Kruit, Nanotechnology 0957-4484 19, 225305 (2008). 10.1088/0957-4484/19/22/225305 (Pubitemid 351652155)
-
(2008)
Nanotechnology
, vol.19
, Issue.22
, pp. 225305
-
-
Van Dorp, W.F.1
Hagen, C.W.2
Crozier, P.A.3
Kruit, P.4
-
6
-
-
66449115768
-
-
1530-6984,. 10.1021/nl900717r
-
L. van Kouwen, A. Botman, and C. W. Hagen, Nano Lett. 1530-6984 9, 2149 (2009). 10.1021/nl900717r
-
(2009)
Nano Lett.
, vol.9
, pp. 2149
-
-
Van Kouwen, L.1
Botman, A.2
Hagen, C.W.3
-
7
-
-
44649199785
-
Inhibiting spontaneous etching of nanoscale electron beam induced etching features: Solutions for nanoscale repair of extreme ultraviolet lithography masks
-
DOI 10.1116/1.2917076
-
M. G. Lassiter, T. Liang, and P. D. Rack, J. Vac. Sci. Technol. B 1071-1023 26, 963 (2008). 10.1116/1.2917076 (Pubitemid 351776799)
-
(2008)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.26
, Issue.3
, pp. 963-967
-
-
Lassiter, M.G.1
Liang, T.2
Rack, P.D.3
-
8
-
-
0023016914
-
ELECTRON BEAM DECOMPOSITION of CARBONYLS on SILICON
-
DOI 10.1016/0167-9317(86)90072-9
-
V. Scheuer and H. Koops, Microelectron. Eng. 0167-9317 5, 423 (1986). 10.1016/0167-9317(86)90072-9 (Pubitemid 17548472)
-
(1986)
Microelectronic Engineering
, vol.5
, Issue.1-4
, pp. 423-430
-
-
Scheuer, V.1
Koops, H.2
-
9
-
-
0000094364
-
-
1071-1023,. 10.1116/1.589154
-
P. Hoyle, J. Cleaver, and H. Ahmed, J. Vac. Sci. Technol. B 1071-1023 14, 662 (1996). 10.1116/1.589154
-
(1996)
J. Vac. Sci. Technol. B
, vol.14
, pp. 662
-
-
Hoyle, P.1
Cleaver, J.2
Ahmed, H.3
-
10
-
-
57249103622
-
-
1071-1023,. 10.1116/1.2976576
-
A. Botman, D. A. M. De Winter, and J. J. L. Mulders, J. Vac. Sci. Technol. B 1071-1023 26, 2460 (2008). 10.1116/1.2976576
-
(2008)
J. Vac. Sci. Technol. B
, vol.26
, pp. 2460
-
-
Botman, A.1
De Winter, D.A.M.2
Mulders, J.J.L.3
-
11
-
-
35148839026
-
Collisions of electrons with trimethylphosphine [P (CH3) 3] molecules
-
DOI 10.1103/PhysRevA.76.042701
-
A. Domaracka, P. Moejko, E. Ptasińska-Denga, and C. Szmytkowski, Phys. Rev. A 1050-2947 76, 042701 (2007). 10.1103/PhysRevA.76.042701 (Pubitemid 47534149)
-
(2007)
Physical Review A - Atomic, Molecular, and Optical Physics
, vol.76
, Issue.4
, pp. 042701
-
-
Domaracka, A.1
Moejko, P.2
Ptasinska-Denga, E.3
Szmytkowski, C.4
-
12
-
-
0032557316
-
-
0009-2614,. 10.1016/S0009-2614(98)00290-5
-
C. Tian and C. R. Vidal, Chem. Phys. Lett. 0009-2614 288, 499 (1998). 10.1016/S0009-2614(98)00290-5
-
(1998)
Chem. Phys. Lett.
, vol.288
, pp. 499
-
-
Tian, C.1
Vidal, C.R.2
-
13
-
-
0033639643
-
6. Absolute total cross section measurements from 1 to 250 eV
-
DOI 10.1088/0953-4075/33/1/302
-
C. Szmytkowski, P. Mozejko, G. Kasperski, and E. Ptasinska-Denga, J. Phys. B 0953-4075 33, 15 (2000). 10.1088/0953-4075/33/1/302 (Pubitemid 32212808)
-
(2000)
Journal of Physics B: Atomic, Molecular and Optical Physics
, vol.33
, Issue.1
, pp. 15-22
-
-
Szmytkowski, C.1
Mozejko, P.2
Kasperski, G.3
Ptasinska-Denga, E.4
-
14
-
-
14944366469
-
Dynamic profile calculation of deposition resolution by high-energy electrons in electron-beam-induced deposition
-
DOI 10.1016/j.ultramic.2004.11.011, PII S0304399104002098, Proceedings of the Ninth Conference on Frontiers of Electron Microscopy in Materials Science
-
K. Mitsuishi, Z. Q. Liu, M. Shimojo, M. Han, and K. Furuya, Ultramicroscopy 0304-3991 103, 17 (2005). 10.1016/j.ultramic.2004.11.011 (Pubitemid 40363980)
-
(2005)
Ultramicroscopy
, vol.103
, Issue.1
, pp. 17-22
-
-
Mitsuishi, K.1
Liu, Z.Q.2
Shimojo, M.3
Han, M.4
Furuya, K.5
-
15
-
-
29044446431
-
-
1071-1023,. 10.1116/1.2101732
-
J. D. Fowlkes, S. J. Randolph, and P. D. Rack, J. Vac. Sci. Technol. B 1071-1023 23, 2825 (2005). 10.1116/1.2101732
-
(2005)
J. Vac. Sci. Technol. B
, vol.23
, pp. 2825
-
-
Fowlkes, J.D.1
Randolph, S.J.2
Rack, P.D.3
-
16
-
-
27744484845
-
-
0021-8979,. 10.1063/1.2085307
-
N. Silvis-Cividjian, C. W. Hagen, and P. Kruit, J. Appl. Phys. 0021-8979 98, 084905 (2005). 10.1063/1.2085307
-
(2005)
J. Appl. Phys.
, vol.98
, pp. 084905
-
-
Silvis-Cividjian, N.1
Hagen, C.W.2
Kruit, P.3
-
17
-
-
56549088650
-
-
1932-7447,. 10.1021/jp8040204
-
M. Rajappan, L. L. Zhu, A. D. Bass, L. Sanche, and C. R. Arumainayagam, J. Phys. Chem. C 1932-7447 44, 17319 (2008). 10.1021/jp8040204
-
(2008)
J. Phys. Chem. C
, vol.44
, pp. 17319
-
-
Rajappan, M.1
Zhu, L.L.2
Bass, A.D.3
Sanche, L.4
Arumainayagam, C.R.5
-
18
-
-
4944227804
-
-
0144-235X,. 10.1080/01442350412331284625
-
C. C. Perry, N. S. Faradzhev, D. H. Fairbrother, and T. E. Madey, Int. Rev. Phys. Chem. 0144-235X 23, 289 (2004). 10.1080/01442350412331284625
-
(2004)
Int. Rev. Phys. Chem.
, vol.23
, pp. 289
-
-
Perry, C.C.1
Faradzhev, N.S.2
Fairbrother, D.H.3
Madey, T.E.4
-
19
-
-
65249130686
-
-
10.1021/jp807824c
-
J. D. Wnuk, J. M. Gorham, S. Rosenberg, W. F. Van Dorp, T. E. Madey, C. W. Hagen, and D. H. Fairbrother, J. Phys. Chem. C 113, 2487 (2009). 10.1021/jp807824c
-
(2009)
J. Phys. Chem. C
, vol.113
, pp. 2487
-
-
Wnuk, J.D.1
Gorham, J.M.2
Rosenberg, S.3
Van Dorp, W.F.4
Madey, T.E.5
Hagen, C.W.6
Fairbrother, D.H.7
-
20
-
-
33751392578
-
-
0897-4756,. 10.1021/cm00019a032
-
Z. Xue, H. Thridandam, H. D. Kaesz, and R. F. Hicks, Chem. Mater. 0897-4756 4, 162 (1992). 10.1021/cm00019a032
-
(1992)
Chem. Mater.
, vol.4
, pp. 162
-
-
Xue, Z.1
Thridandam, H.2
Kaesz, H.D.3
Hicks, R.F.4
-
21
-
-
0342778780
-
-
0042-207X,. 10.1016/0042-207X(62)90978-8
-
P. A. Redhead, Vacuum 0042-207X 12, 203 (1962). 10.1016/0042-207X(62) 90978-8
-
(1962)
Vacuum
, vol.12
, pp. 203
-
-
Redhead, P.A.1
-
22
-
-
0000756752
-
-
0021-9606,. 10.1063/1.475780
-
C. Olsen and P. A. Rowntree, J. Chem. Phys. 0021-9606 108, 3750 (1998). 10.1063/1.475780
-
(1998)
J. Chem. Phys.
, vol.108
, pp. 3750
-
-
Olsen, C.1
Rowntree, P.A.2
-
23
-
-
34248374269
-
Inelastic electron scattering and energy-selective negative ion reactions in molecular films on silicon surfaces
-
DOI 10.1016/j.apsusc.2007.02.002, PII S0169433207001936, The 4th International Workshop on Basic Aspects of Nonequilibrium Plasmas Interacting with Surfaces; Negative Ions, their function and Designability, and the 4th EU-Japan Joint Symposium on plasma Pro
-
C. D. Lane and T. M. Orlando, Appl. Surf. Sci. 0169-4332 253, 6646 (2007). 10.1016/j.apsusc.2007.02.002 (Pubitemid 46734484)
-
(2007)
Applied Surface Science
, vol.253
, Issue.16
, pp. 6646-6656
-
-
Lane, C.D.1
Orlando, T.M.2
-
24
-
-
21144450152
-
-
1063-777X,. 10.1063/1.1542441
-
A. D. Bass and L. Sanche, Low Temp. Phys. 1063-777X 29, 202 (2003). 10.1063/1.1542441
-
(2003)
Low Temp. Phys.
, vol.29
, pp. 202
-
-
Bass, A.D.1
Sanche, L.2
|