Preparation of molybdenum oxide thin films by MOCVD

Journal of Alloys and Compounds

Volumn 434-435, Issue SPEC. ISS., 2007, Pages 701-703

  Guerrero, R Martinez ^a   Garcia, J R Vargas ^a   Santes, V ^b   Gomez, E ^c  

^a INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

^b INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

^c Instituto de Quimica de la UNAM   (Mexico)

Author keywords

Thermal analysis; Thin films; Vapour deposition; X ray diffraction

Indexed keywords

CRYSTAL GROWTH; CRYSTAL ORIENTATION; MOLYBDENUM COMPOUNDS; OXIDE FILMS; SYNTHESIS (CHEMICAL); THERMOANALYSIS; VAPOR DEPOSITION; X RAY DIFFRACTION;

CRYSTALLINE QUALITY; DEPOSITION TEMPERATURES; MOLYBDENUM OXIDE; POST ANNEALING TREATMENT;

THIN FILMS;

EID: 33947691707     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2006.08.227     Document Type: Article

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