Single-crystal nanowires grown via electron-beam-induced deposition

Nanotechnology

Volumn 19, Issue 34, 2008, Pages

  Klein, K L ^a,b   Randolph, S J ^a   Fowlkes, J D ^b   Allard, L F ^b   Meyer III, H M ^b   Simpson, M L ^a,b   Rack, P D ^a,b  

^a University of Tennessee Knoxville   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; ELECTRIC WIRE; METALS; SEMICONDUCTOR MATERIALS; THREE DIMENSIONAL;

DIRECT WRITING (ADDITIVE); ELECTRON BEAM-INDUCED DEPOSITION (EBID); METALLIC MATERIALS; NANOSCALE PRECISION; ORGANIC PRECURSORS; THREE DIMENSIONAL (3D);

NANOSTRUCTURED MATERIALS;

FLUORIDE; NANOWIRE; TUNGSTEN; TUNGSTEN HEXAFLUORIDE;

ARTICLE; CHEMICAL COMPOSITION; CHEMICAL STRUCTURE; CRYSTAL STRUCTURE; CRYSTALLIZATION; ELECTRON BEAM; ELECTRON DIFFRACTION; ELECTRON MICROSCOPY; PRIORITY JOURNAL; ROENTGEN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 48249128399     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/34/345705     Document Type: Article

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