Ultrahigh resolution focused electron beam induced processing: The effect of substrate thickness

Nanotechnology

Volumn 22, Issue 11, 2011, Pages

  Van Dorp, W F ^a,d   Lazic I ^a   Beyer, A ^b   Golzhauser A ^b   Wagner, J B ^c   Hansen, T W ^c   Hagen, C W ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b BIELEFELD UNIVERSITY   (Germany)

^c TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^d UNIVERSITY OF GRONINGEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

A-CARBON; AVERAGE SIZE; CARBON SUBSTRATES; ESCAPE DEPTH; FOCUSED ELECTRON BEAMS; MONTE CARLO SIMULATION; PRIMARY ELECTRONS; SECONDARY ELECTRONS; SUBSTRATE THICKNESS; ULTRAHIGH RESOLUTION;

COMPUTER SIMULATION; DEPOSITS; ELECTRON BEAMS; ELECTRONS; MONTE CARLO METHODS; PLATINUM;

SUBSTRATES;

EID: 79951835645     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/11/115303     Document Type: Article

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