Electron-beam-induced deposition of 3-nm-half-pitch patterns on bulk Si

Journal of Vacuum Science and Technology B

Volumn 29, Issue 6, 2011, Pages

  Van Oven, J C ^a   Berwald, F ^a   Berggren, K K ^a,b   Kruit, P ^a   Hagen, C W ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRON BEAM LITHOGRAPHY;

BULK SAMPLES; EFFECT OF NOISE; ELECTRON BEAM-INDUCED DEPOSITION; LINE VOLTAGE; NOISE SOURCE; PROXIMITY EFFECTS; SCANNING ELECTRON-BEAM LITHOGRAPHIES;

ELECTRON BEAMS;

EID: 84255189900     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3640743     Document Type: Article

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