Electrically conducting, ultra-sharp, high aspect-ratio probes for AFM fabricated by electron-beam-induced deposition of platinum

Ultramicroscopy

Volumn 133, Issue , 2013, Pages 62-66

  Brown, Jason ^a   Kocher, Paul ^a   Ramanujan, Chandra S ^a   Sharp, David N ^a   Torimitsu, Keiichi ^b   Ryan, John F ^a  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b NTT Basic Research Laboratories   (Japan)

Author keywords

AFM probes; Conducting AFM; Electron beam induced deposition

Indexed keywords

AFM PROBE; CONDUCTING AFM; ELECTRICAL RESISTANCES; ELECTRON BEAM-INDUCED DEPOSITION; ENHANCED SENSITIVITY; HIGH ASPECT RATIO; IMAGING PERFORMANCE; TOPOGRAPHICAL IMAGING;

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; DEPOSITION; PLATINUM; POWER SPECTRAL DENSITY;

PROBES;

GOLD; NANOSPHERE; PLATINUM;

ARTICLE; ATOMIC FORCE MICROSCOPY; CONTROLLED STUDY; ELECTRIC CONDUCTIVITY; ELECTRIC POTENTIAL; ELECTRON BEAM; IMAGE ANALYSIS; NANOFABRICATION; NANOPROBE; PARTICLE SIZE; SENSITIVITY ANALYSIS; SPECTROMETRY; SURFACE PROPERTY;

AFM PROBES; CONDUCTING AFM; ELECTRON-BEAM-INDUCED DEPOSITION;

ELECTRIC CONDUCTIVITY; ELECTRONS; GOLD; MICROSCOPY, ATOMIC FORCE; PLATINUM;

EID: 84879309522     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2013.05.005     Document Type: Article

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