Composition control of electron beam induced nanodeposits by surface pretreatment and beam focusing

Journal of Physical Chemistry C

Volumn 113, Issue 52, 2009, Pages 21516-21519

  Sychugov, Ilya ^a   Nakayama, Yoshiko ^a   Mitsuishi, Kazutaka ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM FOCUSING; CARBON CONTENT; COMPOSITION CONTROL; CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; ELECTRON BEAM FOCUSING; ELECTRON BEAM-INDUCED DEPOSITION; ELEMENTAL ANALYSIS; FOCUSED ION BEAM MILLING; FORMING METALS; SILICON MEMBRANES; SURFACE CARBON; SURFACE PRETREATMENT; THIN EDGE;

CHEMICAL ANALYSIS; CONTROL SURFACES; ELECTRON BEAMS; ELECTRONS; TRANSMISSION ELECTRON MICROSCOPY;

NANOSTRUCTURES;

EID: 73849129566     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp9079684     Document Type: Article

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