Nanolithography by scanning probes on calixarene molecular glass resist using mix-and-match lithography

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 12, Issue 3, 2013, Pages

  Kaestner, Marcus ^a   Hofer, Manuel ^a   Rangelow, Ivo W ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; ELECTRON BEAM LITHOGRAPHY; EXTREME ULTRAVIOLET LITHOGRAPHY; GLASS; PHENOLS; QUANTUM ELECTRONICS; SCANNING PROBE MICROSCOPY;

CRITICAL DIMENSION; E-BEAM LITHOGRAPHY; FABRICATION TECHNOLOGIES; LITHOGRAPHIC TECHNOLOGIES; PLACEMENT ACCURACY; SCANNING PROBE NANO-LITHOGRAPHY; THROUGHPUT CAPABILITY; ULTRAHIGH RESOLUTION;

NANOLITHOGRAPHY;

EID: 84891406151     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.JMM.12.3.031111     Document Type: Article

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