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Volumn 2, Issue 4, 2006, Pages 481-484

Easy writing of nanopatterns on a polymer film using electrostatic nanolithography

(3) Jegadesan, Subbiah a Sindhu, Swaminathan a Valiyaveettil, Suresh a

a NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

Author keywords

Atomic force microscopy; Electrostatic interactions; Nanolithography; Polymers; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROSTATICS; NANOTECHNOLOGY; PATTERN RECOGNITION SYSTEMS; POLYMERS; THIN FILMS;

ELECTROSTATIC INTERACTIONS; ELECTROSTATIC NANOLITHOGRAPHY; POLYMER FILMS;

NANOSTRUCTURED MATERIALS;

NANOMATERIAL; POLY(METHYL METHACRYLATE);

ARTICLE; ARTIFICIAL MEMBRANE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; ELECTRICITY; ELECTROCHEMISTRY; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; PHOTOGRAPHY; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; ELECTROCHEMISTRY; ELECTROSTATICS; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; MICROSCOPY, ATOMIC FORCE; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; PHOTOGRAPHY; POLYMETHYL METHACRYLATE; SURFACE PROPERTIES;

EID: 33644899086 PISSN: 16136810 EISSN: 16136829 Source Type: Journal
DOI: 10.1002/smll.200500370 Document Type: Article

Times cited : (21)

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