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Volumn 97, Issue , 2012, Pages 96-99
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Scanning probe nanolithography on calixarene
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Author keywords
Calixarene; Molecular resist; Nanofabrication; Scanning probe lithography (SPL); STM lithography
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Indexed keywords
AMBIENT CONDITIONS;
CALIXARENES;
CONSTANT-CURRENT;
DIRECT-PATTERNING;
FOWLER-NORDHEIM;
MOLECULAR RESISTS;
POSITIVE-TONE;
PROCESS LATITUDES;
PROXIMITY EFFECTS;
RESORCINARENE;
SCANNING PROBE LITHOGRAPHY;
SCANNING PROBE NANO-LITHOGRAPHY;
SCANNING PROBES;
SILICON SUBSTRATES;
STM-LITHOGRAPHY;
TIP SPEED;
NANOTECHNOLOGY;
RADIATION EFFECTS;
LITHOGRAPHY;
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EID: 84865478470
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mee.2012.05.042 Document Type: Article |
Times cited : (33)
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References (34)
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