Scanning proximal probes for parallel imaging and lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 6, 2008, Pages 2367-2373

  Ivanova, K ^a   Sarov, Y ^a   Ivanov, Tzv ^a   Frank, A ^a   Zollner J ^a   Bitterlich, Ch ^a   Wenzel, U ^a   Volland, B E ^a   Klett, S ^a   Rangelow, I W ^a   Zawierucha, P ^b   Zielony, M ^b   Gotszalk, T ^b   Dontzov, D ^c   Schott, W ^c   Nikolov, N ^d   Zier, M ^e   Schmidt, B ^e   Engl, Wolfgang ^f   Sulzbach, T ^f   Kostic, I ^g   more..

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

^b WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^c SIOS Messtechnik GmbH   (Germany)

^d Microsystems Ltd   (Bulgaria)

^e INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^f NANOWORLD SERVICES GMBH   (Germany)

^g INSTITUTE OF CHEMISTRY   (Slovakia)

Author keywords

[No Author keywords available]

Indexed keywords

BENDING CONTROLS; BOTTOM-UP; PARALLEL IMAGING; PIEZORESISTIVE SENSORS; POWERFUL TOOLS; PROXIMAL PROBES;

SCANNING;

EID: 57249104981     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2990789     Document Type: Article

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