Scanning probe lithography approach for beyond CMOS devices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8680, Issue , 2013, Pages

  Durrani, Zahid ^a   Jones, Mervyn ^a   Kaestner, Marcus ^b   Hofer, Manuel ^b   Guliyev, Elshad ^b   Ahmad, Ahmad ^b   Ivanov, Tzvetan ^b   Zoellner, Jens Peter ^b   Rangelow, Ivo W ^b  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Nanoelectronics; Nanolithography beyond CMOS; Scanning probe lithography; Single electron devices

Indexed keywords

BEYOND CMOS; LITHOGRAPHIC PROCESS; QUANTUM-EFFECT DEVICES; ROOM-TEMPERATURE OPERATION; SCANNING PROBE LITHOGRAPHY; SEMICONDUCTOR TECHNOLOGY; SINGLE-ELECTRON DEVICES; TECHNOLOGY PLATFORMS;

CMOS INTEGRATED CIRCUITS; NANOELECTRONICS; NANOIMPRINT LITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR QUANTUM DOTS;

TECHNOLOGY;

EID: 84878391625     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2012199     Document Type: Conference Paper

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