Scanning proximal probe lithography for sub-10 nm resolution on calix[4]resorcinarene

Journal of Vacuum Science and Technology B

Volumn 29, Issue 6, 2011, Pages

  Kaestner, Marcus ^a   Rangelow, Ivo W ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; VACUUM APPLICATIONS;

AMBIENT CONDITIONS; CALIX[4]RESORCINARENES; CONSTANT CURRENT; DIRECT-PATTERNING; EXPOSURE PARAMETERS; HIGH REPRODUCIBILITY; LITHOGRAPHIC METHODS; MOLECULAR RESISTS;

PROBES;

EID: 84255183857     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3662092     Document Type: Article

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