Nanolithography based on the formation and manipulation of nanometer-size organic liquid menisci

Nano Letters

Volumn 5, Issue 6, 2005, Pages 1161-1164

  Martinez, Ramsés V ^a   Garcia, Ricardo ^a  

^a INSTITUTO DE MICROELECTRÓNICA DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONDENSATION; ELECTRIC POTENTIAL; GROWTH (MATERIALS); NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; NATURAL FREQUENCIES; X RAY PHOTOELECTRON SPECTROSCOPY;

OCTANE; ORGANIC LIQUIDS; POWER LAW PARAMETERIZATION; SCANNING PROBES;

ORGANIC SOLVENTS;

1 OCTENE; 1-OCTENE; ALKENE; NANOMATERIAL; OCTANE; OXYGEN; SILICON; WATER;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL STRUCTURE; CHEMISTRY; KINETICS; MACROMOLECULE; METHODOLOGY; NANOTECHNOLOGY; OSCILLOMETRY; TIME;

ALKENES; KINETICS; MACROMOLECULAR SUBSTANCES; MICROSCOPY, ATOMIC FORCE; MODELS, MOLECULAR; NANOSTRUCTURES; NANOTECHNOLOGY; OCTANES; OSCILLOMETRY; OXYGEN; SILICON; TIME FACTORS; WATER;

EID: 21644459682     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl0505243     Document Type: Article

References (28)

1. Quate, C. F. Surf. Sci. 1997, 386, 259.
2. Cavallini, M; Biscarini, F; Leon, S.; Zerbetto, F.; Bottari, G.; Leigh, D. A. Science 2003, 299, 531.
3. Ginger, D. S.; Zhang, H.; Mirkin, C. A. Angew. Chem., Int. Ed. 2004, 43, 30.
4. Wouters, D.; Schubert, U. S. Angew. Chem., Int. Ed. 2004, 43, 2480.
5. Dagata, J. A Sehneir, J.; Harary, H. H.; Evans, C. J.; Postek, M. T.; Bennet, J. Appl. Phys. Lett. 1990, 56, 2001.
6. Snow, E. S.; Campbell, P. M.; Buot, F. A.; Park, D.; Marrian, C. R. K.; Magno, R. Appl. Phys. Lett. 1998, 72, 3071.
7. Matsumoto, K.; Gotoh, Y.; Maeda, T.; Dagata, J. A.; Harris, J. S. Appl. Phys. Lett. 2000, 76, 239.
8. Bouchiat, V.; Faucher, M.; Thirion, C.; Wernsdorfer, W.; Fournier, T.; Pannetier, B. Appl. Phys. Lett. 2001, 79, 123.
9. Chien, F. S.; Chou, Y.-C.; Chen, T. T.; Hsieh, W.-F.; Chao, T. S.; Gwo, S. J. Appl. Phys. 2001, 89, 2465.
10. Garcia, R.; Tello, M.; Moulin, J. F.; Biscarini, F. Nano Lett. 2004, 4, 1115.
11. Cooper, E. B.; Manalis, S. R.; Fang, H.; Dai, H.; Matsumoto, K.; Minne, S. C.; Hunt, T.; Quate, C. F. Appl. Phys. Lett. 1999, 75, 3566.
12. Garcia, R.; Calleja, M.; Rohrer, H. J. Appl. Phys. 1999, 86, 1898.
13. Xie, X. N.; Chung, H. J.; Xu, H.; Xu, X.; Sow, C. H.; Wee, A. T. S. J. Am. Chem. Soc. 2004, 126, 7665.
14. Kuramochi, H.; Ando, K.; Tokizaki, T.; Yokoyama, H. Appl. Phys. Lett. 2004, 84, 4005.
15. Lyuksyutov, S. F.; Paramonov, P. B.; Juhl, S.; Vaia, R. A. Appl. Phys. Lett. 2003, 83, 4405.
16. Martin, C.; Rius, G.; Borrise, X.; Perez-Murano, F. Nanotechnology, in press, 2005.
17. Maoz, R.; Frydman, E.; Cohen, S. R.; Sagiv, J. Adv. Mater. 2000, 12, 725.
18. Rolandi, M.; Suez, I.; Dai, H.; Frechet, J. M. Nano Lett. 2004, 4, 889.
19. Cavallini, M.; Mei, P.; Biscarini, F.; Garcia, R. Appl. Phys. Lett. 2003, 83, 5286.
20. Hoeppener, S.; Maoz, R. Sagiv, J. Nano Lett. 2003, 3, 761.
21. Farkas, N.; Comer, J. R.; Zhang, G.; Evans, E.A; Ramsier, R. D.; Wight, S.; Dagata, J. A. Appl. Phys. Lett. 2004, 85, 5691.
22. Tello, M.; Garcia, R. Appl. Phys. Lett. 2003, 83, 2339.
23. Tello, M.; Garcia, R.; Martín-Gago, J. A.; Martinez, N. F.; Martin-Gonzalez, M. S.; Aballe, L.; Baranov, A.; Gregoratti, L. Adv. Mater., in press, 2005.
24. Suez, I.; Backer, S. A.; Frechet, J. M. J. Nano Lett. 2005, 5, 321.
25. Reagan Kinser, C.; Schmitz M. J.; Hersam, M. C. Nano Lett. 2005, 5, 91.
26. Garcia, R.; San Paulo, A. Phys Rev. B 1999, 60, 4961.
27. Tello, M.; Garcia, R. Appl. Phys. Lett. 2001, 79, 424.
28. Teuschler, T.; Mahr, K.; Miyazaki, S.; Hundhausen, M.; Ley, L. Appl. Phys. Lett. 1995, 67, 3144.